Centre National De La Recherche Scientifique

Hitachi, Ltd.

Université Paris Sud Xi

Stmicroelectronics S.a.

Université Paris-Sud 11

Universite De Paris Sud (Paris Xi)

Université Paris—sud

Université De Paris-Sud Xi

Claude Chappert

Thibaut Devolder

Joerg Wunderlich

Bryan Gallagher

Harry Bernas

Jan Zemen

Riichiro Takemura

Takayuki Kawahara

Kenchi Ito

Hiromasa Takahashi

Richard P Fournel

David Arfon Williams

Tomas Jungwirth

Paul Crozat

V&eacute;ronique Mathet

Dafin&eacute; Ravelosona-Ramasitera

Jacques Ferre

Thibault Devolder

Cedric Maufront

Joo-Von Kim

Joo-von Kim

Jacques-Olivier Klein

Sumanta Chaudhuri

Weisheng Zhao

David Williams

Brian Gallagher

An architecture and method are provided for reading and writing, in parallel or in series, an electronic memory component based on a two-dimensional matrix of two-terminal binary memory unit cells built into a crossbar architecture. The component includes a logical column-selector located outside the matrix and activating at least one column, one or more cells of which are subjected to read or write processing. Also provided is a component and method with the reading of the status of the cells by differential detection on from two cells of two different rows, either between a storage column and a constant reference column, or between two rows or two storage columns. A component is also provided in which specific selection structure is exclusively dedicated to read operations, and/or in which complementary cells in two complementary columns connected together are encoded in a single atomic operation by means of a single write current.

Logical memory architecture, in particular for MRAM, PCRAM, or RRAM

A method of operating a magnetoresistive device is described. The device comprises a ferromagnetic region configured to exhibit magnetic anisotropy and to allow magnetisation thereof to be switched between at least first and second orientations and a gate capacitively coupled to the ferromagnetic region. The method comprises applying an electric field pulse to the ferromagnetic region so as to cause orientation of magnetic anisotropy to change for switching magnetisation between the first and second orientations.

Magnetoresistive device

Method of controlling a magnetoresistive device using an electric field pulse

A magnetic memory device comprises a magnetic tunnel junction (MTJ) connecting to a bit line to a sense line through an isolation transistor. The MTJ includes a ferromagnetic layer having a magnetic hard axis. An assist current line overlies the bit line and is insulated from the bit line. The MTJ is switchable between a first, relatively high resistance state and a second, relatively low resistance state. The assist current line applies a magnetic field along the magnetic hard axis in the ferromagnetic layer, independently of current flow through the MTJ for assisting switching of the MTJ between the first and second states.

Magnetic memory device

A magnetoresistive memory element including a trapped magnetic region and a free magnetic region separated by a barrier layer. The free magnetic region comprises a stacking of at least two antiferromagnetically-coupled ferromagnetic layers, a layer magnetic moment vector being associated with each layer, the resulting magnetic moment vector, equal to the sum of the layer magnetic moment vectors, having an amplitude smaller than at least 40% of the amplitude of the layer magnetic moment vector of maximum amplitude. The anisotropy field and/or the demagnetizing field tensor is not identical for the at least two ferromagnetic layers, whereby the angular deviations of the layer magnetic moment vectors are different at the time of the application of an external magnetic field, which enables at least two methods for directly writing into the memory element, as well as its initialization.

MRAM element

Process for writing on a material, in which said material is irradiated by means of a beam of light ions, such as for example Heions, said beam of light ions having an energy of the order of or less than a hundred keV, wherein this material comprises a plurality of superposed thin-layers, at least one of said thin layers being magnetic and in that one or more regions having sizes of the order of 1 micrometer or less are irradiated, the irradiation dose being controlled so as to be a few 10ions/cmor less, the irradiation modifying the composition of atomic planes in the material at one or more interfaces between two layers of the latter.

Magnetic etching process, especially for magnetic or magnetooptic recording

The invention provides a method of treating a material to cause the material to evolve from one phase to a more ordered phase, the method comprising an operation of irradiating the material in which the irradiating particles are suitable, by their nature and by their energy, for inducing displacements of the atoms in the material towards positions that favor ordering of the material. Advantageously, the invention also provides apparatus for magnetically recording information, the apparatus comprising a material deposited on a substrate at a temperature of less than 350&deg; C. and that has been subjected to irradiation with irradiating particles that are suitable, by their nature and their energy, for inducing displacements of the atoms in the material towards positions that favor relaxation of the material.

Method of treating materials by irradiation

Growing community of inventors

Garches, France

Claude Chappert