Adixen Vacuum Products

Pfeiffer Vacuum Gmbh

Cindy Thovex

Bertrand Bellet

Julien Bounouar

Arnaud Favre

Nicolas Chapel

The present invention relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, implemented in a measuring station. The measuring method comprises: The invention also relates to an associated measuring station.

Station and method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure

The present invention relates to a station for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, said transport carrier comprising a rigid casing () containing an aperture and a removable door () allowing the aperture to be closed, the measuring station comprising: The invention also relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure.

An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.5&#xd7;d wherein D is the distance between the plane containing the infrared radiation sources and the photomask and d is the distance between the center points of two neighboring infrared radiation sources, and in that the gas injection system comprises a plurality of gas injectors distributed in a plane parallel to the plane of the photomask in such a way that the injectors follow a 90&#xb0; rotational invariance about the center point of the photomask.

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La Clusaz, France

Cindy Thovex