Lawrence Livermore National Security, LLC

University of California

Cindy C Larson

Jerald A Britten

Tiziana C Bond

Hoang Tan Nguyen

Claire Gu

Thomas C Carlson

Nazar Ileri

Xuan Yang

A method of fabricating a multilayer dielectric (MLD) diffraction grating by providing a multilayer stack having a grating layer, and anisotropically etching the grating layer to form grating lines having an initial lineheight, an initial linewidth, and an initial grating duty cycle, that are greater than a target lineheight, a target linewidth, and a target grating duty cycle, respectively. An isotropic wet etch solution is then used to etch back the grating lines to the target lineheight, the target linewidth, and the target grating duty cycle so as to minimize electric field intensities and maximize diffraction efficiency for a given set of MLD illumination conditions.

Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency

A nanoscale structure fabricated on a planar end facet of an optic fiber is described, to enable detection of molecules by surface-enhanced Raman scattering. The nanoscale structure may comprise an array of nanopillars. The nanoscale structure may also comprise a non periodic, or random, surface-relief structure. The nanoscale structure may be coated in a metal, comprising, for example, silver, gold, aluminum, iridium, platinum, palladium, copper, or a combination of the same. The nanoscale structure may be fabricated on a planar end facet of an optical fiber by interference lithography.

Nanoscale structures on optical fiber for surface enhanced Raman scattering and methods related thereto

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Tracy, CA, United States of America

Cindy C Larson