Boe Technology Group Co., Ltd.

Ordos Yuansheng Optoelectronics Co., Ltd.

Chunlong Yan

Qiang Li

Jianjun Li

Long Zhen

Zecheng Li

Xin Xin Bai

Mingqian Hao

Guiqi Liu

Delong Wang

Heewoong Kim

A mask, a device and method for exposure are provided. The mask of the present disclosure includes: a first transparent region configured to allow light of a first wavelength to pass therethrough and filter out light of a second wavelength; and a second transparent region configured to allow the light of the second wavelength to pass therethrough, wherein the light of the second wavelength is light for exposure.

Mask, device and method for exposure

The present disclosure provides a display substrate, including a base substrate, and a black matrix pattern and a color filter pattern on the base substrate. The black matrix pattern defines one or more display regions of the display substrate and a non-display region surrounding the one or more display regions. The color filter pattern includes a plurality of color filter sub-patterns, each color filter sub-pattern includes a plurality of color filter units, and each color filter unit includes a body portion. At least one of the color filter units further includes an anchoring portion extending from the body portion, and in a direction perpendicular to an extension direction of the body portion, the anchoring portion has a size greater than the body portion. The present disclosure further provides a method for manufacturing the display substrate, a display device and a mask.

Display substrate, manufacturing method thereof, display device and mask

A carrying platform and an exposure method are provided. The carrying platform includes: a plurality of sub-stands, configured to co-carry an object. Each sub-stand includes: a platform having a first carrying surface; and a position adjusting unit disposed on a side of the platform away from the first carrying surface and configured to adjust at least one of height or inclined angle of the platform.

Carrying platform and exposure method

Growing community of inventors

Beijing, China

Chunlong Yan