Asml Netherlands B.v.

Lam Research Corporation

Novellus Systems Incorporated

Bmf Material Technology Inc.

Bmf Nano Material Technology Co., Ltd

Bmf Precision Technology (wuxi) Inc.

Chunguang Xia

Karl Frederick Leeser

Ramesh Chandrasekharan

Andrew David LaForge

Yue Ma

Douglas L Keil

Edward J Augustyniak

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Dzmitry Labetski

Christianus Wilhelmus Johannes Berendsen

Henricus Gerardus Tegenbosch

Klaus Martin Hummler

Marc Guy Langlois

Kornelis Frits Feenstra

Kerim Nadir

John Tom Stewart

Maksim Loginov

Seyedmohammad Mojab

Alexander Shatalov

Arun Johnkadaksham

Matthias Kraushaar

Jonghoon Baek

Silvia De Dea

David Robert Evans

John Tom Stewart, Iv

Gregory James Wilson

Brandon Wilson Verhoff

Deniz Van Heijnsbergen

Nina Vladimirovna Dziomkina

Alexander H Slocum

Damien Martin Slevin

Jeremy Tucker

Thomas G Jewell

John Kawola

Rui Miguel Duarte Rodrigues Nunes

Jason Bassi

Rui Miguel Duarte Rodreigues Nunes

Jiawen Xu

Rui Miguel Duarte Rodriges Nunes

Fast 3D printing with high resolution is made possible by projecting light and an image from optical light engine comprises a micro display chip and a light source, through a projection lens of a multi-projection lens system onto printing material, e.g., a curable resin, wherein the multi-projection lens system comprises two or more projection lenses each with different imaging ratios wherein the image and light are projected through only one projection lens of the multi-projection lens system at a time.

Multi-scale system for projection micro stereolithography

A multi-material 3-D printing system and method including at least two printing heads each with a transparent window circumscribed by an ejection nozzle. Each ejection nozzle is coupled to a respective pump that pumps resin from a respective vat onto a respective window. The resin is cured from below the window by exposure to a digital image displayed by a micro display chip. To switch resins, the sample is moved across a plurality of suction nozzles towards a second printing head. A respective one of the suction heads is coupled to a vacuum that effectuates the intake of residual resin from the underside of the sample.

System and method of low-waste multi-material resin printing

An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Guiding device and associated system

Parallel surfaces on two substrates are established with specific distances of separation, typically within a 10-micron tolerance. In general, one surface is a surface of a transparent membrane or hard window. On one embodiment, the gap defined by the distance of the transparent membrane or hard window and the other surface used to precisely control the dimensions of layers in projection micro stereolithography, however the methods for establishing the relative positions of two surfaces can be adapted to other applications.

Methods of controlling dimensions in projection micro stereolithography

In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

Cleaning a structure surface in an EUV chamber

A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

A method for multi-material high resolution projection micro stereolithography for 3-D printing of a sample, comprising: A) generating a 3D digital model of the sample to be printed in a computer, B) arranging a lens having an optical axis, a charge coupled device (CCD), and a printing head relative to a surface of a substrate, C) positioning the printing head, D) moving the printing head relative to the substrate by moving the substrate, the printing head, or both the substrate and the printing head, E) sending an image from the control computer to an LCD micro display chip, projecting the image from the LCD or DLP chip through the lens onto a surface of the flat tip of the printing head, and F) and changing the printing material to be used for printing a following layer or layer section.

Immersion multi-material projection micro stereolithography with non-stick gas permeable transparent membrane

A method for high resolution projection micro stereolithography for 3-D printing comprising: generating a 3D digital model of the sample to be printed in a computer, slicing the digital model into a sequence of images, wherein each of the images of the sequence represents a layer of the 3D digital model, positioning a transparent printing head relative to a resin vat containing a photo-sensitive resin, moving the transparent printing head into position for selectively exposing the photosensitive resin, sending an image from the sequence of images to a LCD or DLP chip, and together with a light source projecting the image through a lens onto the flat tip of the transparent printing head to initiate cure of the photosensitive resin in areas where the projected image allows light from the light source to reach the photosensitive resin.

Immersion projection micro stereolithography

A fluid is directed toward a surface of an optical element based on a first flow pattern, the surface of the optical element including debris and the fluid directed based on the first flow pattern moving at least some of the debris to a first stagnation region at the surface of the optical element; and the fluid is directed toward the optical element based on a second flow pattern, the fluid directed based on the second flow pattern moving at least some of the debris to a second stagnation region on the surface of the optical element, the second stagnation region and the first stagnation region being different locations at the surface of the optical element. Directing the fluid toward the surface of the optical element based on the second flow pattern removes at least some of the debris from the first stagnation region.

Controlled fluid flow for cleaning an optical element

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San Diego, CA, United States of America

Chunguang Xia