Candescent Technologies Corporation

Silicon Video, Inc.

Candescent Intellectual Property Services, Inc.

Canon Kabushiki Kaisha

Chungdee Pong

Theodore S Fahlen

John D Porter

Christopher J Curtin

Paul N Ludwig

Robert G Neimeyer

Duane A Haven

John E Field

Donald John Elloway

Kristin Brigham

Provided is a method of etching an etch layer using a polycarbonate layer as a mask. The method includes placing an etch structure in a reaction chamber, the etch structure including an etch layer underlying a polycarbonate layer, the polycarbonate layer having apertures. The etch layer is then etched using a low-pressure high density plasma generate at a pressure in the range of approximately 1 to 30 millitorr where the ionized particle concentration is at least 10 ions/cm and where the ionized particle concentration is substantially equal throughout the volume of the reaction chamber. To increase the etch rate, the etch structure can be cooled or biased. To decrease the etch rate, an inert gas can be added to the process gas mixture used to form the plasma.

Plasma etching using polycarbonate mask and low-pressure high density plasma

Scattered or/and transmitted light is employed to determine characteristics, including dimensional information, of an object ( ) such as part ( ) of a flat-panel display. The dimensional information includes the average diameter of openings ( ) in the object, the average density of the openings, and the average thickness of a layer ( ) of the object. Light-diffraction patterns are produced to determine characteristics, such as abnormalities ( and ), of crossing lines ( and ) in such an object.

Use of scattered and/or transmitted light in determining characteristics, including dimensional information, of object such as part of flat-panel display

A flat panel display and a method for forming a flat panel display. In one embodiment, the flat panel display includes a wall which is held in place by a structure formed either on the faceplate or on the backplate. In one embodiment the supporting structure is formed by two adjacent walls that form a slot which mechanically restrains the wall. In another embodiment a slot is formed within the faceplate and the walls of the slot mechanically restrain the wall. In one embodiment wall segments are inserted into supporting structures that mechanically restrain each wall segment. In another embodiment a UV curable or a heat curable adhesive is used to maintain walls in their proper alignment and position. In yet another embodiment a conductive material is melted so as to bond conductive lines located on the wall and conductive lines located on the faceplate. This bond electrically connects the conductive lines located on the wall and the conductive lines located on the faceplate and maintains the wall in the proper alignment. The present invention eliminates the need for feet which attach to individual walls for maintaining the walls in the proper alignment.

Wall assembly and method for attaching walls for flat panel display

Wall assembly and method for attaching walls for flat panel displays

Provided is a method of etching an etch layer using a polycarbonate layer as a mask. The method includes placing an etch structure in a reaction chamber, the etch structure including an etch layer underlying a polycarbonate layer, the polycarbonate layer having apertures. The etch layer is then etched using a low pressure-high density plasma generate at a pressure in the range of approximately 1 to 30 millitorr where the ionized particle concentration is at least 10.sup.11 ions/cm.sup.3 and where the ionized particle concentration is substantially equal throughout the volume of the reaction chamber. To increase the etch rate, the etch structure can be heated or biased. To decrease the etch rate, an inert gas can be added to the process gas mixture used to form the plasma.

Plasma etching using polycarbonate mask and low pressure-high density

A field emission display device has a faceplate and a backplate. The faceplate includes a faceplate interior side with an active region made of a plurality of phosphor pixel elements; and the backplate has a backplate interior side with a plurality of field emitters. Sidewalls are positioned between the faceplate and the backplate, to form an enclosed sealed envelope between the sidewalls, backplate interior side and the faceplate interior side. At least one spacer wall in the envelope supports the backplate and the faceplate against forces acting in a direction toward the envelope. At least one internal structure fixes and constrains the faceplate and the backplate, and aligns a plurality of phosphor pixels with corresponding field emitters. Additionally, the faceplate can include at least one faceplate fiducial, and the backplate include a corresponding backplate fiducial. The faceplate fiducial is optically aligned with the backplate fiducial. First, the spacer wall is positioned in the wall gripper. The faceplate and backplate fiducials are then optically aligned, and the spacer wall then introduced into the locator. Phosphor pixels are aligned with their corresponding field emitters. There is no need for external fixturing devices in the high temperature bonding and sealing processes of the display.

Field emission device with internal structure for aligning phosphor

A faceplate for a field emission display includes a substrate defining a faceplate interior side. Pluralities of phosphor pixels are disposed on the faceplate interior side. A black matrix grid is formed of column and row guard bands on the faceplate interior side. At least one wall gripper is formed in a column or row guard band, with the wall gripper adapted to receive a spacer wall and mount it relative to the pluralities of phosphor pixels. The faceplate can include a faceplate fiducial that optically aligns to a corresponding backplate fiducial. A spacer wall is positioned in the wall gripper and mounted relative to a corresponding locator formed on a backplate interior side. The wall gripper includes a receiving trench that is positioned adjacent to a plurality of deformation accommodation gaps.

Growing community of inventors

Cupertino, CA, United States of America

Chungdee Pong