Macronix International Co., Ltd.

Chung Yu Hung

Jeng Gong

Wing Chor Chan

Chih-Min Hu

Chih Min Hu

A method of manufacturing a junction-field-effect-transistor (JFET) device, the method includes the steps of providing a substrate of a first-type impurity; forming a first well region of a second-type impurity in the substrate; forming a second well region and a third well region of the first-type impurity separated from each other in the first well region; forming a fourth well region of the first-type impurity between the second well region and the third well region; forming a first diffused region of the second-type impurity between the second well region and the fourth well region; forming a second diffused region of the second-type impurity between the third well region and the fourth well region; forming a pair of first doped regions of the second-type impurity in the first well region, and a pair of second doped regions of the first-type impurity in the second well region and the third well region respectively; forming a third doped region of the second-type impurity in the first well region between the second well region and the third well region over the fourth well region; and forming a patterned conductive layer including a pair of drain terminals on the pair of first doped regions, a pair of gate terminals on the pair of second doped regions, and a source terminal on the third doped region.

Junction-field-effect-transistor devices and methods of manufacturing the same

A junction-field-effect-transistor (JFET) device includes a substrate of a first-type impurity, a first well region of a second-type impurity in the substrate, a pair of second well regions of the first-type impurity separated from each other in the first well region, a third well region of the first-type impurity between the pair of second well regions, a first diffused region of the second-type impurity between the third well region and one of the second well regions, and a second diffused region of the second-type impurity between the third well region and the other one of the second well regions.

A Schottky diode comprises an ohmic layer that can serve as a cathode and a metal layer that can serve as an anode, and a drift channel formed of semiconductor material that extends between the ohmic and metal layers. The drift channel includes a heavily doped region adjacent to the ohmic contact layer. The drift channel forms a Schottky barrier with the metal layer. A pinch-off mechanism is provided for pinching off the drift channel while the Schottky diode is reverse-biased. As a result, the level of saturation or leakage current between the metal layer and the ohmic contact layer under a reverse bias condition of the Schottky diode is reduced.

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Changhua County, Taiwan

Chung Yu Hung