Lg Chem, Ltd

Chung Ryong Choi

Sung Soo Yoon

No Jin Park

Jin Kon Kim

A block copolymer and a use thereof are disclosed herein. The block copolymer of the present application may have excellent self-assembly properties or phase separation characteristics and simultaneously have characteristics capable of changing the self-assembly structure formed once, or provide a block copolymer capable of forming a pattern of phase separation structures in a polymer membrane.

Block copolymer containing photo-sensitive moiety

The present application may provide a block copolymer and a use thereof. The present application may provide a block copolymer and a use thereof. The block copolymer of the present application may have excellent self-assembly properties or phase separation characteristics and simultaneously have characteristics capable of changing the self-assembly structure formed once, or provide a block copolymer capable of forming a pattern of phase separation structures in a polymer membrane.

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Gyeongsangbuk-do, South Korea

Chung Ryong Choi