Taiwan Semiconductor Manufacturing Comp. Ltd.

Chung-Nan Chen

Yeh-Chieh Wang

Hong-Hsing Chou

Jaw-Lih Shih

Wolf Hung

Chao-Li Shih

Hsin-Kuo Chang

Kuang Hsiung Cheng

The present disclosure provides an interference filter, a lithography system incorporating an interference filter, and a method of fabricating an interference filter. The interference filter includes a transparent substrate having a front surface and a back surface, a plurality of alternating material layers formed over the front surface of the transparent substrate that form a bandpass filter, and an anti-reflective structure formed over the back surface of the transparent substrate. The alternating material layers alternate between a relatively high refractive index material and a relatively low refractive index material.

Systems and methods for a narrow band high transmittance interference filter

A light source includes a plurality of ultraviolet (UV) light emitting diodes (LEDs) and an LED phase shift controller coupled to the plurality of UV LEDs adapted to control the phase shift of each UV LED in the plurality of UV LEDs. The plurality of UV LEDs forms a UV LED array. An ultraviolet lithography system can include a light source as described above. The system can further include a mirror assembly in a light path of the light source, the mirror assembly having a polarization mirror with an interference coating. A method provides a light source for an ultraviolet lithography system including the element of providing an plurality of UV LEDs that emit UV light and the element of controlling a phase shift of the plurality of UV LEDs with an LED phase shift controller coupled to each UV LED or arrays of the UV LEDs in the plurality of UV LEDs.

Ultraviolet light emitting diode array light source for photolithography and method

Growing community of inventors

Zhubei, Taiwan

Chung-Nan Chen