United Microelectronics Corp.

Au Optronics Corporation

Chung-Jung Chen

Cheng-Hung Chang

Jui-Fang Chen

Chien-Kuo Ko

Shih-Po Yeh

Ho Lu

Chih-Ming Yang

Ji-Fu Kung

Tung-I Yen

Ching-Pei Lin

Li-Hsin Yang

Zheng-Yang Li

Chun-Man Li

Chi-Chun Yao

Chung-Shih Shen

A remote control device for a manufacturing equipment and a method for detecting manual control are provided. The method for detecting the manual control on the manufacturing equipment includes the following steps. A cursor pattern is created. When the user interface is automatically controlled, a history location of the cursor pattern shown on a user interface of the manufacturing equipment is detected to obtain a location distribution. The location distribution is stored. A current location of the cursor pattern shown on the user interface is detected. If the current location is not within the location distribution, it is deemed that the user interface is manually controlled.

Remote control device for manufacturing equipment and method for detecting manual control

A liquid crystal display (LCD) includes a back bezel, a light guide plate (LGP) having a light incident surface opposite to a first side wall of the back bezel, an LCD panel disposed above the LGP, a frame and a light source unit. There is an accommodation space between the first side wall of the back bezel and the light incident surface of the LGP. The frame is assembled with the back bezel to fix and surround the LGP and the LCD panel. A portion of the frame extends across the upper side of the accommodation space. A portion of the second side wall of the frame is opposite to the entrance side of the accommodation space and has a first securing portion. The light source unit has a second securing portion. When the light source unit is mounted/attached into the accommodation space, the second securing portion is jointed the first securing portion to secure the light source unit.

Liquid crystal display

The invention provides an ion current measurement device for a tool having an ion source. The ion current measurement device comprises an ion collecting cup and a replaceable liner. The ion collecting cup is disposed in the tool and the ion collecting cup possesses a cup opening facing the ion source. The replaceable liner is disposed in the ion collecting cup and the replaceable liner entirely covers a continuous inner sidewall of the ion collecting cup.

Ion current measurement device

A method of performing an ion implantation is provided. A workpiece is installed in the ion implanter. A wafer is provided in a receiving space within an ion implanter. An ion beam is generated by an ion source of the ion implanter. The bombard of the ion beam is blocked and particles generated during or after conducting the step of generating the ion beam are collected by the workpiece.

Method of performing ion implantation

An ion beam blocking component suitable for blocking an ion beam generated by an ion source of an ion implanter is provided. The blocking component includes a front plate, a back plate, and a plurality of side plates. The front plate has at least one opening. The back plate is behind the front plate, and has a plurality of grooves formed on one surface thereof facing the front plate. The side plates are connected between the front plate and the back plate, and a receiving space is formed between these plates.

Ion beam blocking component and ion beam blocking device having the same

A method for reducing particles during ion implantation is provided. The method involves the use of an improved Faraday flag including a beam plate having thereon a beam striking zone comprising a recessed trench pattern on which the ion beam scans to and fro. An ion beam selected from the mass analyzer is blocked by the Faraday flag in a closed position between the mass analyzer and the semiconductor wafer. A beam current of the ion beam impinging on the beam striking zone of the beam plate is measured. After the beam current measurement, the Faraday flag is removed such that the ion beam impinges on the semiconductor wafer.

Method for reducing particles during ion implantation

An optical projection system can receive a red light beam, green light beam, and blue light beam. The optical projection system includes a color-combination prism, and the light beams respectively enter the color-combination prism from three surfaces and are combined into a mixed light beam, which exits from another surface. A projection lens set receives the mixed light beam to perform the projection. Each of the light beams further includes a liquid crystal reflection panel and a wire grid polarizer (WGP). The liquid crystal reflection panel is parallel to the corresponding surfaces of the color-combination prism. In the design, before the light beam entering the color-combination prism, they are first reflected by the WGP onto the liquid crystal reflection panel, and the liquid crystal reflection panels respectively with a polarizing state reflect the light beams, passing through the WGP and directly propagating toward the color-combination prism.

Optical projection system and method

An optical projection system has a parallel light source for producing a parallel light beam. A first color splitter splits the parallel light beam into a first color beam and a color mixing beam. The color mixing beam includes a second color beam and a third color beam. A first both-side telecentric group is disposed on a first light path of the first color beam, so as to transform into a first light beam. A second both-side telecentric group is disposed on a second light path of the color mixing beam. A second color splitter is disposed on the second light path to split the color mixing beam into a second light beam and a third light beam. A light-combining unit receives the first, second, and third light beams and combines into a mixed beam. Then the mixed beam is projected.

Growing community of inventors

Hsinchu, Taiwan

Chung-Jung Chen