Lam Research Corporation

Chung-Ho Huang

Andrew Lui

Shih-Jeun Fan

Tuqiang Q Ni

Henry T Chan

John Jensen

Vincent M Wong

Chad R Weetman

Jackie Seto

Rainer Unterguggenberger

Chin-Chuan Chang

Nicolas J Bright

David J Hemker

Tuan Ngo

Weinan Jiang

Farro F Kaveh

Hae-Pyng Jea

Tung Hsu

Anthony Le

Frank Lin

Robert C Hefty

Ngoc-Diep Nguyen

Paul Ballintine

Christopher Thorgrimsson

Terrence George Bernier

Cheng-Chieh Lin

Bostjan Pust

Raymond Chau

Gerramine S Manuguid

Charles Potter

Tom Trinh

Connie Lam

Nicolas Grinschgl

Yu Ding

Jacqueline Seto

Dave Humbird

Chin Chuan Chang

Steven Salkow

Ni Tuqiang

A data collection system for semiconductor manufacturing includes: T substrate processing tools, where each of the T substrate processing tools includes: N processing chambers, where each of the N processing chambers includes a processing chamber controller configured to receive a plurality of different types of data during operating of the corresponding one of the N processing chambers, where the plurality of different types of data have different formats, where the processing chamber controller is further configured to format the plurality of different types of data into formatted data, and where T and N are integers; and a data diagnostic services computer configured to: receive and store the formatted data as categories in a common file having a table-like data structure including rows with contextual data; and in response to a request, generate an output file including a subset of the data from the common file.

Data capture and transformation to support data analysis and machine learning for substrate manufacturing systems

Various embodiments herein relate to a Mixed Reality (MR) control platform to operate a semiconductor manufacturing tool in an MR environment and to display data associated with the semiconductor manufacturing tool. In son embodiments, the MR control platform comprises an MR control system and an MR headset. The MR control system can obtain sensor data representative of sensor output from a semiconductor manufacturing tool. The MR control system can determine operational information associated with the semiconductor manufacturing tool and based on the sensor data. The MR control system can cause the operational information to be transmitted to the MR headset. The MR headset can receive the operational information associated with the semiconductor manufacturing tool from the MR control system. The MR headset can cause content associated with the operational information and one or more control features to be rendered in an MR environment.

Control of semiconductor manufacturing equipment in mixed reality environments

For etching tools, a neural network model is trained to predict optimum scheduling parameter values. The model is trained using data collected from preventive maintenance operations, recipe times, and wafer-less auto clean times as inputs. The model is used to capture underlying relationships between scheduling parameter values and various wafer processing scenarios to make predictions. Additionally, in tools used for multiple parallel material deposition processes, a nested neural network based model is trained using machine learning. The model is initially designed and trained offline using simulated data and then trained online using real tool data for predicting wafer routing path and scheduling. The model improves accuracy of scheduler pacing and achieves highest tool/fleet utilization, shortest wait times, and fastest throughput.

Model-based scheduling for substrate processing systems

A software emulation system for a gas delivery system of a substrate processing system includes an input/output bus and an emulator bus. An input/output bus adapter includes a switch configured to route data packets from a system controller for the substrate processing system to one of the input/output bus and the emulator bus. A gas delivery system emulator in communication with the emulator bus is configured to receive the data packets from the input/output bus adapter via the emulator bus and perform software-based emulation of a plurality of hardware components of the gas delivery system that are interconnected. The plurality of hardware components are modelled using one or more software models and include a gas source and at least one of a valve and a mass flow controller.

Software emulator for hardware components in a gas delivery system of substrate processing system

A system includes an interface and a controller. The interface is configured to receive a state of a substrate processing tool comprising a plurality of process modules configured to process a substrate. The controller is configured to correlate the state with an input previously received by the substrate processing tool from the interface based on the state and to generate an output to control the substrate processing tool based on the correlation.

System and method for automating user interaction for semiconductor manufacturing equipment

A method of operating one or more back end circuits of a plasma processing system, comprising: prior to a front end module receiving one or more wafers to be processed, receiving preliminary data at a back end circuit, wherein the preliminary data indicates a recipe and a predetermined number, the predetermined number indicating a number of wafers to be processed; determining whether a plasma processing chamber is ready for processing; and if the chamber is ready for processing and via the back end circuit, selecting a load lock, based on the predetermined number, instructing the front end module to pull the one or more wafers into the load lock, enabling the chamber to process a first wafer of the one or more wafers according to the recipe, and subsequent to the processing of the first wafer, instructing the front end module to remove the first wafer from the chamber.

Methods and apparatus for integrating and controlling a plasma processing system

The amount of RF power supplied to a plasma in a vacuum plasma processing chamber is gradually changed on a preprogrammed basis in response to signals stored in a computer memory. The computer memory stores signals so that other processing chamber parameters (pressure, gas species and gas flow rates) remain constant while the gradual change occurs. The stored signals enable rounded corners, instead of sharp edges, to be etched, e.g., at an intersection of a trench wall and base.

Plasma processing method and apparatus with control of plasma excitation power

A computer-implemented method for performing data management in a plasma processing system is provided. The method includes providing a recipe-and component control module (RACCM). The RACCM is a server that includes a plurality of intelligent agents, which are configured to interact with the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents. The RACCM further includes a set of provisional agents, which is configured to perform recipe management by distributing at least part of a recipe to at least one of the plurality of intelligent agents and the coordinating agent.

Methods for performing data management for a recipe-and-component control module

A system for facilitating plasma processing tool component management across plurality of tools is provided. The system includes means for receiving first component data for first plurality of components, including identification and usage history for a first plurality of components, at first database associated with first tool. The system also includes means for receiving second component data for second plurality of components at second database associated with second tool, which is different from first tool. The system further includes means for synchronizing first and second component data with third database. The synchronizing includes synchronizing between third database and at least one of first and second database rules that govern usage of at least one component of first and second plurality of components. The third database is coupled to exchange data with plurality of tools. The system yet also includes means for obtaining information, using rules and usage history data about given component prior to performing one of replacement, analysis, and maintenance.

Component-tracking system and methods therefor

A plasma-processing tool for processing a substrate using at least a first process recipe and a second process recipe is provided. The plasma-processing tool includes transducers configured to collect process data streams, each process data stream pertaining to a process parameter being monitored during recipe execution. The tool also includes a logic circuitry configured for receiving a set of meta-data wherein each meta-data includes identification data about the substrate and the process recipe being executed. The logic circuitry is also configured for receiving a set of process data streams, each of which being associated with a specific process recipe. The logic circuitry further includes storing the meta-data and the process data streams associated with the first process recipe as a first file and the meta-data and the process data streams associated with the second process recipe as a second file.

Processing information management system in a plasma processing tool

In a plasma processing system, a method for dynamically establishing a baseline is provided. The method includes processing a first substrate. The method also includes collecting a first signal data for the first substrate. The method further includes comparing the first signal data against the baseline. The method moreover includes including the first signal data in a recalculation of the baseline if the first signal data is within a confidence level range, which is in between a top level above the baseline and a bottom level below the baseline.

Automatic dynamic baseline creation and adjustment

An arrangement for performing at least one of collecting and analyzing data from a tool cluster configured to process a set of substrates is provided. The arrangement includes a plurality of tools from which at least one tool of the plurality of tools has a chamber for processing at least one of the set of substrates. The arrangement also includes a plurality of secondary servers configured to collect sensor data from the plurality of tools. The arrangement further includes a primary server communicably coupled with the plurality of secondary servers and configured to execute a database management system. The sensor data is indexed using a plurality of indexing applications on the plurality of secondary servers prior to being forwarded to the primary server for use by the database management system. Indexing includes associating a sensor data item with an identity of a server where the sensor data item is stored.

Primary server architectural networking arrangement and methods therefor

A computer-implemented method for facilitating plasma processing tool component management across plurality of tools is provided. The method includes receiving first component data for first plurality of components, including identification and usage history, at first database associated with first tool. The method also includes receiving second component data for second plurality of components at second database associated with second tool, which is different from first tool. The method further includes synchronizing first and second component data with third database. The synchronizing includes synchronizing between third database and at least one of first and second database rules that govern usage of at least one component of first and second plurality of components. The third database is coupled to exchange data with plurality of tools. The method yet also includes obtaining information, using rules and usage history data about given component prior to performing one of replacement, analysis, and maintenance.

Dynamic component-tracking system and methods therefor

A recipe-and component control module (RACCM) is provided. The RACCM is a server for performing data management in a plasma processing system with a plurality of components. The RACCM includes a plurality of intelligent agents. Each intelligent agent of the intelligent agents is configured to interact with each component of the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents.

Recipe-and-component control module and methods thereof

A targeted data collection system configured to collect processing data in a plasma processing system is provided. The system includes a data collection host and a plurality of plasma processing components having a plurality of sensors such that each of the plurality of plasma processing components having at least one sensor. Each of the sensors implements at least one intelligent targeted data agent that governs sensor data collection behavior. The system further includes a communication network coupling data collection host and plurality of sensors for bi-directional communication such that a given sensor of plurality of sensors receive information from data collection host pertaining to plasma processing system conditions occurring elsewhere from given sensor. Information received from data collection host causes the given sensor to collect at least a portion of the processing data in a first manner different from a second manner employed by sensor prior to receiving e information from the data collection host.

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San Jose, CA, United States of America

Chung-Ho Huang