Semiconductor Manufacturing International (shanghai) Corporation

Chun Yan Xin

Jianping Yang

Jie Guang Huo

A complementary metal oxide semiconductor (CMOS) image sensing device includes a semiconductor substrate; a photodiode defined on the substrate; a gate dielectric layer provided over the photodiode and the substrate; a polysilicon interconnect contacting a given area of the photodiode via an opening in the gate dielectric layer; a reset transistor coupled to the photodiode; a source follower transistor coupled to the photodiode; and a select transistor coupled to the source follower transistor. The given area of the photodiode defines a node that is coupled to the reset transistor and source follower transistor.

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Shanghai, China

Chun Yan Xin