Taiwan Semiconductor Manufacturing Comp. Ltd.

Chun-Yan Chen

Chyi-Tsong Ni

Ruei-Hung Jang

Cheng-Ming Chiu

Embodiments of an image-sensor device structure and a method of manufacturing thereof are provided. The image-sensor device structure includes a semiconductor substrate and a light-sensing region in the semiconductor substrate. The image-sensor device structure also includes an interconnect structure over the semiconductor substrate, and the interconnect structure includes a transparent dielectric layer over the light-sensing region. The transparent dielectric layer has an optical transmittance ranging from about 90% to about 97%.

Growing community of inventors

Zhubei, Taiwan

Chun-Yan Chen