United Microelectronics Corp.

Chun-Li Lin

Ching-Wen Hung

Kuo-Liang Yeh

Chien-Tung Yue

Jinn-Horng Lai

The present invention provides a method of generating dummy patterns and calibration kits, including steps of generating devices-under-test (DUTs) using a point of said chip window layer as reference point in a unit cell, generating calibration kits corresponding to the DUTs using the point as reference point in corresponding unit cells, generating DUT dummy patterns for each DUTs individually in the unit cell, copying the DUT dummy patterns in the unit cell to the corresponding calibration kits in the corresponding unit cells using the point as reference point, and merging all of the unit cell and corresponding unit cells into a final chip layout.

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Changhua County, Taiwan

Chun-Li Lin