Cambrios Film Solutions Corporation

Au Optronics Corporation

Industrial Technology Research Institute

Tpk Touch Solutions Inc.

Intellectual Property Innovation Corporation

Tpk Glass Solutions (xiamen) Inc.

Tpk Universal Solutions Limited

Chun-Hung Chu

Wei-Chia Fang

Chung-Chin Hsiao

Yi-Chen Tsai

Meng-Yun Wu

Chih-Jen Hu

Tsu-Hsuan Lai

Wei-Cheng Hsu

Shih-Ching Chen

Yung-Hui Yeh

Ho-Chien Wu

Tai-Jui Wang

Ya-Ting Lin

Sheng-Wen Huang

Hsiao-Chiang Yao

Yi-Lung Yang

Jui-Wen Yang

Jia-Xiang Wu

Yeh-Sheng Wang

Lung-Pin Chen

A conductive laminated structure includes a conductive layer and a thickening layer. The conductive layer extends in a first direction. The thickening layer is disposed over or under the conductive layer. The conductive laminated structure can withstand more than 40,000 folding times without breakage when a radius of curvature R is equal to 3 mm, a folding direction is perpendicular or parallel to the first direction, and a folding angle is 180&#xb0;. A foldable electronic device is also provided herein.

Conductive laminated structure and foldable electronic device

A conductive structure having a self-assembled protective layer and a self-assembled coating composition are provided. The self-assembled coating composition includes a resin, a solvent, and a self-assembled additive. The self-assembled additive includes alkylamine, fluoroalkylamine, fluoroaniline, or a derivative thereof. The self-assembled additive has a concentration in a range of from about 0.01 mg/L to about 100 mg/L in the self-assembled coating composition. The conductive structure includes a substrate, a conductive layer, and the self-assembled protective layer. The conductive layer is disposed over the substrate. The self-assembled protective layer covers the conductive layer and has a resin, a solvent, and the above-mentioned self-assembled additive.

Conductive structure having self-assembled protective layer and self-assembled coating composition

A silver nanowire (SNW) protection layer structure includes a substrate; a SNW layer, disposed on the substrate and covering only a partial region of a surface of the substrate, the SNW layer including a plurality of SNW channels; and a SNW protection layer, disposed on the SNW layer and covering a region corresponding to the plurality of SNW channels, the SNW protection layer including a light-resistant antioxidant. A manufacturing method for the SNW protection layer structure above is further provided. The SNW protection layer structure and the manufacturing method thereof are applicable in a touch sensor.

Silver nanowire protection layer structure and manufacturing method thereof

A method for preparing stacking structure includes providing a substrate; disposing a metallic layer and a silver nanowire layer on the substrate; applying flexographic printing technology to print an anti-etching layer on a surface of the metallic layer or the silver nanowire layer so that the anti-etching layer partially covers the metallic layer or the silver nanowire layer; applying an etching technology to remove a part of the metallic layer or the silver nanowire layer that is not covered by the anti-etching layer and the metallic layer or the silver nanowire layer disposed therebelow with an etching liquid so that the metallic layer comprises: metallic wires; a metallic grid; and a metallic plate; and removing the anti-etching layer. A stacking structure comprises: the substrate; the metallic layer; and the silver nanowire layer. The method for preparing stacking structure and the stacking structure can be applied to a touch sensor.

Method for preparing stacking structure, stacking structure and touch sensor

A method of producing a stacking structure includes providing a substrate; printing, by flexography, a catalyst layer onto the substrate, wherein the catalyst layer includes a grid pattern and a conducting wire pattern connected to the grid pattern; plating, by chemical plating, a metal layer onto the catalyst layer, wherein the metal layer includes a metal grid corresponding in position to the grid pattern of the catalyst layer and a metal conducting wire corresponding in position to the conducting wire pattern of the catalyst layer; and printing, by flexography, a silver nanowire layer onto the metal layer, wherein the silver nanowire layer at least partially overlaps the metal grid. A stacking structure includes a substrate; a catalyst layer; a metal layer; and a silver nanowire layer. The method of producing a stacking structure and the stacking structure are applicable to a touch sensor.

Method of producing stacking structure, stacking structure and touch sensor

A touch panel is provided, including a substrate, a first wire structure, and a second wire structure. The substrate includes a display area and a peripheral area surrounding the display area. The first wire structure includes a first catalyst layer, a first metal layer, and a first transparent conductive layer. The first catalyst layer is disposed above the peripheral area, the first metal layer is disposed above the first catalyst, and the first transparent conductive layer is disposed above the first metal layer. The first wire structure is divided into at least one first wire area and at least one first ground line area adjacent to the first wire area. The second wire structure is disposed under the peripheral area and includes at least one second ground line area, wherein a projection of the first wire area in a vertical direction is opposite to the second ground line area.

Touch panel

A touch panel and a manufacturing method thereof are provided. The touch panel includes a substrate, peripheral leads, a touch sensing electrode, and first intermediate layers. The peripheral leads are disposed in a peripheral area of the substrate. The first intermediate layers are disposed between the peripheral leads and the substrate. The touch sensing electrode includes a plurality of modified metal nanowires. The modified metal nanowires have first surfaces in direct contact with each other at an intersection. The modified metal nanowires have second surfaces with covering structures, and the second surfaces are at a non-intersection.

Touch panel and manufacturing method thereof

A method of manufacturing a touch panel including providing a substrate having a display area and a peripheral area is provided. A metal layer and a metal nanowire layer are disposed, wherein a first portion of the metal nanowire layer is disposed in the display area, and a second portion of the metal nanowire layer and the metal layer are disposed in the peripheral area. A patterned layer with a pattern is disposed. A patterning step is performed according to the patterned layer, wherein the patterning step includes forming the metal layer into multiple peripheral wires and simultaneously forming the second portion of the metal nanowire layer into multiple etching layers by using an etching solution configured to etch the metal layer and the metal nanowire layer. A touch panel is further provided.

A touch panel and a manufacturing method thereof are provided. The touch panel includes a substrate, peripheral leads, a touch-sensing electrode, and first covers. The peripheral leads are disposed on the substrate. Each peripheral lead has a sidewall and an upper surface. The first covers cover the upper surfaces of the peripheral leads. The touch-sensing electrode includes a plurality of modified metal nanowires. The modified metal nanowires have first surfaces in direct contact with each other at an intersection. The modified metal nanowires have second surfaces with a covering structure, and the second surfaces are at non-intersections.

A touch panel includes a substrate, a catalytic layer, peripheral traces, marks, first cover layers and second cover layers. The catalytic layer is formed on the peripheral area of the substrate, and the peripheral traces are formed on the catalytic layer. Each peripheral trace has a side wall and a top surface. The marks are formed on the catalytic layer, and each mark has a side wall and a top surface. The first cover layers cover the top surfaces of the peripheral traces, and the second cover layers cover the top surfaces of the marks. Each of the first cover layers and the second cover layers includes metal nanowires. The manufacturing method of the touch panel and a roll sheet of touch sensors are also disclosed.

Touch panel and manufacturing method therefor, and roll sheet of touch sensor

A thin film transistor including a flexible substrate, a semiconductor layer, a first gate, and a first gate dielectric layer is provided. The semiconductor layer is located on the flexible substrate. The first gate is located on the flexible substrate and corresponds to a portion of the semiconductor layer. The first gate dielectric layer is located between the first gate and the semiconductor layer. The first gate dielectric layer is in contact with the semiconductor layer, and the hydrogen atom concentration of the first gate dielectric layer is less than 6.5&#xd7;10atoms/cm. A method of manufacturing the thin film transistor is also provided.

Thin film transistor and manufacturing method thereof

A pixel structure is formed in a pixel area and coupled to a scan line and a data line. The pixel structure includes a first transistor, a second transistor and a pixel electrode. The first transistor is formed in the pixel area and coupled to the scan line and the data line. The second transistor is formed in the pixel area and coupled to the first transistor. The pixel electrode is formed in the pixel area and coupled to the second transistor. The pixel electrode includes a main portion and a first branch portion. The first branch portion is disposed between the first transistor and the second transistor. An electrophoretic display including the pixel structure is also disclosed herein.

Electrophoretic display and pixel structure therein

An electro-phoretic display film includes a conductive layer, a dielectric layer disposed on the conductive layer, a plurality of electro-phoretic display media, and a sealing material. The dielectric layer has a plurality of micro-cups arranged in an array and a trench surrounding the micro-cups. The electro-phoretic display media are exclusively disposed within the micro-cups, and the sealing material is exclusively disposed within the trench.

Growing community of inventors

Hsinchu, Taiwan

Chun-Hung Chu