Taiwan Semiconductor Manufacturing Comp. Ltd.

C.t.i. Traffic Industries Co., Ltd.

Chun-Hsiung Chen

Yi-Chen Huang

Fang-Che Wu

A hybrid power supply system and a method for extending a power supply time of a secondary battery thereof are provided. The method comprises: a detection unit detecting the magnitude of a load and outputting it to a control unit; wherein when a mains electricity is normal during peak hours, an initial alternating current from the mains electricity is input to a silicon-controlled rectifier, the silicon-controlled rectifier outputs a rectified alternating current, the rectified alternating current is converted into a first direct current to be output an inverter; a control unit controlling a secondary battery to output a second direct current to the inverter during a power supply time according to the magnitude of the load; the first direct current and the second direct current being respectively converted by the inverter and supplied to the load, thereby extending the power supply time of the second battery.

Hybrid power supply system and method of extending power supply time of secondary battery thereof

A wet chemical process tank, or a wet etch tank, that has improved fluid circulation and improved uniformity in the fluid concentration in the tank is disclosed. In a preferred embodiment, a tank body is provided which has a liquid dispenser positioned therein with a plurality of liquid outlets in a vertical surface of the dispenser each having a different diameter opening for compensating the different fluid pressure in the dispenser. A more uniform liquid concentration is thus achieved in the tank cavity to perform a more uniform chemical process on the plurality of wafers. The tank body is further provided with a second endwall which has a second distance from the plurality of wafers that is at least twice the first distance between a first endwall and the plurality of wafers. When the second endwall is at least 0.5 cm shorter than the first endwall, the larger second distance together with the shorter height of the second endwall induces a large volume of liquid to overflow the second endwall and to carry away any film residues or flakes, such as that of a photoresist material, from the tank cavity and thus preventing any possible redeposition of the film residues on the wafer surface and any contamination problems.

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Tainan, Taiwan

Chun-Hsiung Chen