Hon Hai Precision Industry Co., Ltd.

Tsinghua University

Chun-Hai Zhang

Shou-Shan Fan

Peng Liu

Duan-Liang Zhou

Bing-Chu Du

De-Jie Li

Kai-Li Jiang

Li Qian

Yu-Quan Wang

Xue-Wei Guo

Li-Yong Ma

Fu-Jun Wang

Wei Zhao

Xiao-Yang Lin

Pi-Jin Chen

Chang-Hong Liu

Hai-Yan Hao

Li-juan Jiang

Zong-Qian Li

Feng Gao

Cai-Lin Guo

You-Hua Lei

Xin-He Yang

Jing Qi

Li-Jiang Xu

Shi-Wei Lv

Jian-Dong Gao

A carbon nanotube field emitter comprises at least two electrodes and at least one graphitized carbon nanotube structure. The at least one graphitized carbon nanotube structure comprises a first end and a field emission end. The first end is opposite to the field emission end. The first end is fixed between the at least two electrodes, and the field emission end is exposed from the at least two electrodes and configured to emit electrons.

Carbon nanotube field emitter and preparation method thereof

A high temperature resistant wire is provided. The high temperature resistant wire comprises a carbon nanotube wire and a boron nitride layer coated on a surface of the carbon nanotube wire. The boron nitride layer is coaxially arranged with the carbon nanotube wire. A working temperature of the high temperature resistant wire in the air ranges from 0K to 1600K. A working temperature of the high temperature resistant wire in vacuum ranges from 0K to 2500K. A detector using the high temperature resistant wire is also provided.

High temperature resistant wire and detector using the same

A generator and a method for generating far infrared polarized light are related. The generator includes a far infrared light source configured to emit a far infrared light; a polarizer located on a light emitting surface of the far infrared light source, wherein the polarizer includes a carbon nanotube structure including a plurality of carbon nanotubes arranged substantially along the same direction, and the far infrared light passes through the polarizer to form a far infrared polarized light; and a heater configured to heat the carbon nanotube structure. The method includes allowing the far infrared to pass through the carbon nanotube structure and heating the carbon nanotube structure as the far infrared passes through the carbon nanotube structure.

Generator and method for generating far infrared polarized light

A field emission neutralizer is provided. The field emission neutralizer includes a bottom plate and a field emission cathode unit located on the bottom plate. The field emission cathode unit includes a substrate, a shell located on the substrate, a cathode emitter located inside the shell, a mesh grid insulated from the cathode emitter, and a shielding layer insulated from the mesh grid. The cathode emitter includes a cathode substrate and a graphitized carbon nanotube array. The graphitized carbon nanotube array is in electrical contact with the cathode substrate. The graphitized carbon nanotube array is fixed on a surface of the substrate body, and the carbon nanotubes of the graphitized carbon nanotube array are substantially perpendicular to the cathode substrate.

Field emission neutralizer

A method for making a carbon nanotube field emitter is provided. A carbon nanotube film is dealed with a carbon nanotube film in a circumstance with a temperature ranged from 1400 to 1800&#xb0; C. and a pressure ranged from 40 to 60 MPa to form at least one first carbon nanotube structure. The at least one first carbon nanotube structure is heated to graphitize the at least one first carbon nanotube structure to form at least one second carbon nanotube structure. At least two electrodes is welded to fix one end of the at least one second carbon nanotube structure between adjacent two electrodes to form a field emission preparation body. The field emission preparation body has a emission end. The emission end is bonded to form a carbon nanotube field emitter.

A far infrared imaging system includes a first far infrared polarized light generator, a second far infrared polarized light generator, a first receiving device, a second receiving device, and a computer. The first far infrared polarized light generator emits a first far infrared polarized light, and the second far infrared polarized light generator emits a second far infrared polarized light. The first receiving device receives a first far infrared reflected polarized light, and the second receiving device receives a second far infrared reflected polarized light. The computer processes information received by the first receiver and the second receiver. The polarizer of the first far infrared polarized light generator and the second far infrared polarized light generator includes a carbon nanotube structure including a plurality of carbon nanotubes arranged substantially along the same direction.

Far infrared imaging system

A method for making a carbon nanotube field emitter is provided. A carbon nanotube array and a cathode substrate are provided. The carbon nanotube array is heated to form a graphitized carbon nanotube array. A conductive adhesive layer is formed on a surface of the cathode substrate. One end of the graphitized carbon nanotube array is contact with the conductive adhesive layer. The conductive adhesive layer is solidified to fix the graphitized carbon nanotube array on the cathode substrate.

A method for making a carbon nanotube field emitter is provided. At least one carbon nanotube wire and at least two electrodes are provided. The at least one carbon nanotube wire is heated to form at least one graphitized carbon nanotube wire. The at least one graphitized carbon nanotube wire comprises a first end and a second end, and the first end is opposite to the second end. The at least two electrodes are welded to fix the first end between the at least two electrodes. welding the at least two electrodes to fix the first end between the at least two electrodes. The second end of the at least one graphitized carbon nanotube wire is exposed from the at least two electrodes as an electron emission end.

A field emission neutralizer is provided. The field emission neutralizer comprises a bottom plate and at least one field emission cathode unit located on the bottom plate. The field emission cathode unit comprises a substrate, a shell located on the substrate, a mesh grid, a shielding layer insulated and spaced from the mesh grid, and at least one cathode emitter located inside the shell, and insulated and spaced from the mesh grid. The cathode emitter comprises two cathode electrode sheets and a graphitized carbon nanotube structure, the graphitized carbon nanotube structure comprises a first portion and a second portion, the first portion is clamped between the two cathode electrode sheets, and the second portion is exposed outside of the two cathode electrode sheets.

Field emission neutralizer comprising a graphitized carbon nanotube structure

The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.

Electronic beam machining system

The disclosure relates to a method for characterizing a two-dimensional nanomaterial sample. The two-dimensional nanomaterial sample is placed in a vacuum chamber. An electron beam passes through the two-dimensional nanomaterial sample to form a diffraction electron beam and a transmission electron beam to form an image on an imaging device. An angle &#x3b8; between the diffraction electron beam and the transmission electron is obtained. A lattice period d of the two-dimensional nanomaterial sample is calculated according to a formula d sin &#x3b8;&#x2245;d&#x3b8;=&#x3bb;, where &#x3bb; represents a wavelength of the electron beam.

Method for characterizing two dimensional nanomaterial

The disclosure relates to a photolithography method based on electronic beam. The method includes: providing an electronic beam; making the electron beam transmit a two dimensional nanomaterial to form a transmission electron beam and a number of diffraction electron beams; shielding the transmission electron beam; and radiating a surface of an object by the plurality of diffraction electron beams. The photolithography method is high efficiency and has low cost.

Photolithography method based on electronic beam

A kind of photosensitive carbon nanotube slurry is disclosed. The photosensitive carbon nanotube slurry includes a first mixture and a second mixture. The first mixture includes carbon nanotubes, conducting particles, and a first organic carrier. The second mixture includes a photo polymerization monomer, a photo initiator, and a second organic carrier. The weight percentage of the first mixture and the second mixture ranges from about 50% to about 80% and about 20% to about 50%, respectively. Methods for making the photosensitive carbon nanotube slurry and methods for making cathode emitters using the photosensitive carbon nanotube slurry are also disclosed.

Method for making carbon nanotube slurry

The disclosure relates to a low energy electron microscopy. The electron microscopy includes a vacuum chamber; an electron gun used to emit electron beam; a diffraction chamber; an imaging device; a sample holder used to fix two-dimensional nanomaterial sample; a vacuum pumping device; and a control computer. The electron beam transmits the sample to form a transmission electron beam and diffraction electron beam. The control computer includes a switching module to switch the work mode between a large beam spot diffraction imaging mode and small beam spot diffraction imaging mode.

Growing community of inventors

Beijing, China

Chun-Hai Zhang