Mosel Vitelic Corporation

Chun-chieh Lee

Dong-Tay Tsai

Yi-Hua Chin

Hua-Jen Tseng

Hua-jen Tseng

An inspection device for examining a piece of aperture graphite of an extraction electrode, and the aperture graphite includes a to-be-examined curve and a to-be-examined engagement portion. The inspection device includes a sidewall surface having a standard curve marked thereon, and an examination engagement portion having a predetermined positional relationship with the sidewall surface. After the to-be-examined engagement portion is engaged with the examination engagement portion, and after the to-be-examined curve is projected onto the sidewall surface, the suitability of the aperture graphite can be determined according to the amount of differences between the projected to-be-examined curve and the standard curve.

Inspection device for examining a piece of aperture graphite of an extraction electrode

A slurry nozzle for supplying slurry in chemical mechanical polishing (CMP) including at least one slurry line, a slurry nozzle enclosure for accommodating the slurry line, and a baffle ring mounted at one end of the slurry nozzle enclosure. A plurality of apertures is formed on the sidewall of the slurry line for the slurry to spray out. The slurry spraying out from the slurry line flows down along the inner sidewall of the slurry baffle ring after the slurry impinges onto the slurry baffle ring.

Growing community of inventors

Pao-Shun, Taiwan

Chun-chieh Lee