Other

National Science Council

Tsinghua University

National Central University

Precision Instrument Development Center National Science Council

Chuen-Horng Tsai

I-Nan Lin

Keh-Chyang Leou

Jyh-Shin Chen

Jiann-Shiun Kao

Jung-Chieh Su

Cheng-Chung Jaing

Zhen-Yu Juang

Tsang-Lang Lin

Yung-Sheng Liu

Ming-Chi Tsai

Kun-Ying Shin

Cheng-Hsun Nien

Wen-Bin Jian

Ming-Hwu Cheng

Chien-Kang Kao

Cheng-Chung Chi

I G Chen

Tsung-Kuang Yeh

Yi-Mei Yang

Teng-Fang Kuo

Chaung Lin

Cheng-Hung Chang

Szu-Che Tsai

Chai-Hao Chang

Py-Shiun Yeh

Ho-Yen Hsiao

An electrodeposition process of platinum and platinum-based alloy nano-particles with addition of ethylene glycol is disclosed. An acidic solution which contains metal chloride includes at least one platinum-based chloride and the alloy thereof, and ethylene glycol are introduced into a reactor as an electrodeposition solution. By applying an external negative potential, platinum particles or platinum-based alloy particles are deposited on the substrate. The above acidic solution is able to provide ionic conductivity during electrodeposition. The added ethylene glycol effectively enhances the removal of chlorine from metal chlorides. Meanwhile, ethylene glycol is used as stabilizer to prevent the particles from aggregation onto the substrate, thereby increasing the dispersion of deposited particles.

Process of electrodeposition platinum and platinum-based alloy nano-particles with addition of ethylene glycol

An electron microscope suitable for observing at least one sample is provided. The sample has at least one testing area, and a material of the sample on the testing area is semiconductive or conductive. The electron microscope includes a stage, an electron gun, and at least one probe. The stage is suitable for carrying the sample and the sample is not electrically grounded. The electron gun is suitable for generating an electron beam and accumulating charges on the sample. When the probe contacts with the testing area, the image contrast of the testing area will change. The current through the probe will also change upon contact. Methods have been provided based on these principles to determine 'when' and 'where' the probe starts to contact the sample surface inside an electron microscope.

Electron microscope, methods to determine the contact point and the contact of the probe

A thermal cracking chemical vapor deposition method for synthesizing a nano-carbon material is provided. The method includes steps of (a) providing a substrate, (b) spreading a catalyst on the substrate, (c) putting the substrate into a reactor, (d) introducing a carbon containing material, and (e) heating the carbon containing material, thereby the carbon containing material being cracked to provide a carbon source for forming the nano-carbon material on the substrate.

Thermal pyrolysising chemical vapor deposition method for synthesizing nano-carbon material

This invention discloses an in-situ monitoring method on the layer uniformity of sputter coatings in a vacuum chamber based on deconvolution of measuring plasma emission spectra. The method of the present invention started from an Ar-normalized Sr intensity distribution derived from deconvoluting the plasma spectra by using Abel inversion method, which was considered as the spatial distribution of the sputtering mass of the source target. The thickness profile on the substrate was then calculated with n-th power of cosine law model. It was observed good agreement between the calculated thickness profile based on spectroscopic measurement and experimental observation. The film uniformity for the same sputter conditions can be monitored by comparing in-situ measurement of Ar-normalized Sr intensity distribution with the standard curve, or by directly calculating thickness distribution on the substrates.

Method for in-situ monitoring layer uniformity of sputter coating based on intensity distribution of plasma spectrum

This invention discloses a manufacturing process for preparing sol-gel optical waveguides comprising the steps of solution preparation, an optical waveguide photoresist module process, and optical waveguide molding and sintering. The solution is prepared by mixing water and alcohol to form an alcoholic solution with a properly adjusted pH value followed by mingling with tetraethylorthosilicate (TEOS) at room temperature. The optical waveguide photoresist module process comprises the steps of soft baking, exposure, development, washing by deionized water, drying by a nitrogen gun, and hard baking. The optical waveguide molding and sintering comprises the steps of spinning, sintering, and photoresist module removal.

Manufacturing process for preparing sol-gel optical waveguides

Process for fabricating plasma with feedback control on plasma density

This invention relates to an inductively-coupled high density plasma producing apparatus and a plasma processing equipment having the apparatus. The plasma processing equipment consists of a shape-adjustable coil (antenna), a RF power generator, an impedance matching network, a plasma chamber, a gas supply system, and a vacuum system. The gases for producing plasma are fed into the plasma chamber. The RF power is fed into the coil to produce plasma in the plasma chamber. This invention is characterized by the provision of a shape-adjustable coil, which is used to shape the RF power profile in the plasma chamber such that the plasma density profile (uniformity) can be controlled.

Inductively-coupled high density plasma producing apparatus and plasma

Growing community of inventors

Hsinchu, Taiwan

Chuen-Horng Tsai