International Business Machines Corporation

Freescale Semiconductor,inc.

Chuck T Le

Dechao Guo

Keith Kwong Hon Wong

Byoung W Min

Thekkemadathil V Rajeevakumar

Satya N Chakravarti

After planarization of a gate level dielectric layer, a dummy structure is removed to form a recess. A first conductive material layer and an amorphous metal oxide are deposited into the recess area. A second conduct material layer fills the recess. After planarization, an electrical antifuse is formed within the filled recess area, which includes a first conductive material portion, an amorphous metal oxide portion, and a second conductive material portion. To program the electrical antifuse, current is passed between the two terminals in the pair of the conductive contacts to transform the amorphous metal oxide portion into a crystallized metal oxide portion, which has a lower resistance. A sensing circuit determines whether the metal oxide portion is in an amorphous state (high resistance state) or in a crystalline state (low resistance state).

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Poughkeepsie, NY, United States of America

Chuck T Le