Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Chuanhui Chen

Yangkun Jing

Fei Liu

Xiaopan Che

Zhiwei Xu

Guofang Sun

A cleaning apparatus and a cleaning method are provided. The cleaning apparatus is used for removing a residue on a substrate, and includes: a deformable device arranged on the substrate; and an excitation device configured to generate an excitation source for the deformable device, so as to enable the deformable device to be deformed under the effect of the excitation source, thereby to drive the substrate to vibrate and enable the residue to fall off from the substrate.

Cleaning apparatus and cleaning method

A rubbing mura detection device is provided, including an infrared imaging unit used to acquire an infrared thermogram of a surface of the substrate, on which the alignment film is provided; and a rubbing mura detection unit used to detect whether or not the alignment film has the rubbing mura in accordance with an infrared radiation brightness temperature distribution in the infrared thermogram.

Rubbing mura detection device

Growing community of inventors

Beijing, China

Chuanhui Chen