Industrial Technology Research Institute

Taiwan Semiconductor Manufacturing Comp. Ltd.

Chuan-Feng Chen

Chia-Chun Hsu

Ming-Chi Chen

Chia-Hung Lin

Chun-Tsung Kuo

Wei-Han Wang

Lai-Sheng Chen

Yu-Lun Ho

Wen-Hung Feng

Jen-Hua Wu

Shou-Ren Chen

Yong-Chen Chung

Wann-Fu Su

A BJT and methods of forming the same are described. The BJT includes a collector region disposed in a substrate, a lower base structure disposed on the collector region, a first dielectric layer surrounding a bottom portion of the lower base structure, and a second dielectric layer surrounding a top portion of the lower base structure. The first dielectric layer includes a first oxide, the second dielectric layer includes a second oxide, and the first and second oxides have different densities. The BJT further includes an upper base structure disposed on the second dielectric layer and the lower base structure, an emitter region disposed on the lower base structure, a sidewall spacer structure disposed between the emitter region and the upper base structure, and the sidewall spacer structure includes a material different from materials of the first and second dielectric layers.

Bipolar junction transistors and methods of forming the same

A semiconductor device structure is provided. The semiconductor device structure includes a collector element formed in or over a semiconductor substrate. The semiconductor device structure also includes a semiconductor element over the collector element, and the semiconductor element has a top surface, a bottom surface, and a side surface. The semiconductor device structure further includes an emitter element over the top surface of the semiconductor element. In addition, the semiconductor device structure includes a base element over the collector element and in direct contact with the side surface of the semiconductor element.

Structure and formation method of semiconductor device with bipolar junction transistor

A microimprint/nanoimprint uniform pressing apparatus is used to provide uniform imprinting pressure to a molding material layer between a substrate and a mold. The uniform pressing apparatus includes a uniform pressing unit for being directly in contact with the mold or the substrate, so as to allow each point to have equal pressure during imprinting and utilize a simple structure to transmit uniform imprinting pressure.

Microimprint/nanoimprint uniform pressing apparatus

A microimprint/nanoimprint device includes a mold, a substrate and an energy transferring module. The substrate is disposed oppositely to the mold and at least has a molding material layer. The energy transferring module includes an energy transferring member and at least one energy source, wherein the energy transferring member is connected to the substrate or the mold, and the energy source provides imprint energy to the substrate or the mold, such that at least part of the imprint energy goes through the energy transferring member to the substrate or the mold for performing imprint molding.

Microimprint/nanoimprint device

A parallelism adjustment device applicable to nano-imprint lithography has an imprint unit, a carrier unit, a parallelism adjustment mechanism, and a driving source. The imprint unit has a first molding plate and an imprinting mold mounted on the first molding plate. The carrier unit has a second molding plate and a substrate mounted on the second molding plate. The parallelism adjustment mechanism has an enclosed resilient film and a fluid filled therein, and is coupled to at least one of the first and second molding plates. The driving source drives at least one of the imprint unit and the carrier unit to form contact between the mold and the moldable layer. The parallelism adjustment device is pressed via the contact to adjust parallelism for the imprint mold and the substrate and uniformly distributes the pressure between the mold and the substrate, making the molding quality of nano-imprint lithography significantly improved.

Parallelism adjustment device

The present invention is a force detecting controlling device for a screw of an injection molding machine, which utilities a load cell as a force sensor for injection, holding pressure and back pressure. The load cell arranged on a rear fixed plate directly detects a force applied onto a ball screw nut. Because the ball screw nut is fastened on the load cell, and the load cell is fixed on the rear fixed plate, the force on a ball screw is directly transmitted to the ball screw nut. Therefore, a total value of the force on the ball screw produced by back pressure and friction among mechanical parts are equal to a force value of the ball screw nut applying onto the load cell. The injection force detected via the load cell for an instant response reaches a close loop control and procedures of holding pressure and back pressure are specifically controlled as well.

Force detecting controlling device of a screw for an injection molding machine

A uniform pressing apparatus used in nanoimprint lithographic process is proposed, including a housing having a first flange; a first carrier unit for carrying an imprint mold and having at least one second flange freely attaches to the first flange; a second carrier unit for carrying a substrate; at least one uniform pressing unit mounted on a imprint force transmission path; and a power source driving at least one of the housing and the second carrier unit to allow a contact to be formed between the mold and the moldable layer. Therefore, the nanoimprint lithographic process is achieved with good parallelism between the substrate and the mold and with uniform pressure distribution.

Growing community of inventors

Hsinchu, Taiwan

Chuan-Feng Chen