Lockheed Martin Corporation

Christopher Wayne Peters

Roland Cadotte, Jr

William G Trueheart, Jr

A method for determining the seam location for each layer of a multilayer radome for use with an array antenna includes the steps of quantizing the radome thickness, and forming an image of the quantized thickness vs. line array position. Seam locations are assigned for an original population, and a genetic algorithm is iterated to optimize a cost function. The cost function is the level of all sidelobes other than the main lobe. The result of the genetic algorithm is an optimized set of seam locations. The radome is built with the seam locations corresponding to the optimized locations.

Radome with optimal seam locations

Method for making a seamed radome for an array antenna and radome with optimal seam locations

A system includes a source of electromagnetic energy or power and an amplitude-sensitive circuit. An amplitude-limiting transmission line couples the source to the circuit. The transmission line includes a semiconductor in the field of the transmission line and a light source for illuminating the semiconductor with light responsive to the amplitude from the source. Application of energy or power to the light source illuminates the semiconductor, which produces a plasma. The plasma tends to attenuate the energy or power reaching the circuit.

Photonic semiconductor electromagnetic limiter

A low/band/high pass filter includes first and second plasmas, each with a path for the flow of electromagnetic energy at frequencies above the plasma frequency. A path for the flow of electromagnetic energy is coupled to the second port of the first plasma and to a first port of the second plasma. The plasma frequency of the second plasma is greater than that of the first plasma. Energy below the plasma frequency of the first plasma is reflected from the first port of the first plasma, and energy above the plasma frequency of the second plasma propagates to the second plasma. That energy above the plasma frequency of the first plasma but below the plasma frequency of the second plasma reflects from the second plasma and is coupled out of the system. That energy at a frequency above the second plasma frequency propagates through the second plasma.

Growing community of inventors

Cherry Hill, NJ, United States of America

Christopher Wayne Peters