Lam Research Corporation

Christopher Thorgrimsson

Douglas L Keil

Chung-Ho Huang

Jean-Paul Booth

Henry T Chan

Rainer Unterguggenberger

Terrence George Bernier

Various embodiments herein relate to a Mixed Reality (MR) control platform to operate a semiconductor manufacturing tool in an MR environment and to display data associated with the semiconductor manufacturing tool. In son embodiments, the MR control platform comprises an MR control system and an MR headset. The MR control system can obtain sensor data representative of sensor output from a semiconductor manufacturing tool. The MR control system can determine operational information associated with the semiconductor manufacturing tool and based on the sensor data. The MR control system can cause the operational information to be transmitted to the MR headset. The MR headset can receive the operational information associated with the semiconductor manufacturing tool from the MR control system. The MR headset can cause content associated with the operational information and one or more control features to be rendered in an MR environment.

Control of semiconductor manufacturing equipment in mixed reality environments

A method for automatically characterizing plasma during substrate processing is provided. The method includes collecting a set of process data, which includes at least data about current and voltage. The method also includes identifying a relevancy range for the set of process data, wherein the relevancy range includes a subset of the set of process data. The method further includes determining a set of seed values. The method yet also includes employing the relevancy range and the set of seed values to perform curve-fitting, wherein the curve-fitting enables the plasma to be automatically characterized.

Methods for automatically characterizing a plasma

An arrangement for creating a set of wafer transfer instructions configured to transfer a wafer between an origination wafer-holding location and a destination wafer-holding location in a plasma cluster tool is provided. The arrangement includes means for receiving a first user-provided location indicator and a second user-provided location indicator on an on-screen graphical representation of the plasma cluster tool. The arrangement also includes means for ascertaining data pertaining to a set of paths between the first user-provided location indicator and the second user-provided location indicator. The arrangement further includes means for forming the set of wafer transfer instructions responsive to the data pertaining to the set of paths, the set of wafer transfer instructions being configured to transfer the wafer along a set of wafer-holding locations associated with one of the set of paths.

Arrangements for creating wafer movement control macros

A computer-implemented method for creating a set of wafer transfer instructions configured to transfer a wafer between an origination wafer-holding location and a destination wafer-holding location in a plasma cluster tool, which has a plurality of wafer-holding locations. The method includes receiving a first user-provided location indicator and a second user-provided location indicator, which graphically identify the origination wafer-holding location and the destination wafer-holding location respectively on the on-screen graphical representation of the plasma cluster tool. The method further includes ascertaining data pertaining to a path between the first user-provided location indicator and the second user-provided location indicator. The method further includes forming the set of wafer transfer instructions responsive to the data pertaining to the path. The set of wafer transfer instructions is configured to transfer the wafer along a set of wafer-holding locations associated with the path.

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Fremont, CA, United States of America

Christopher Thorgrimsson