Rasirc, Inc.

Christopher Ramos

Jeffrey J Spiegelman

Daniel Alvarez, Jr

Russell J Holmes

Edward Heinlein

James John Hogan

Zohreh Shamsi

Alex Deptala

Jeremiah Trammel

Alexander Deptala

Provided herein are methods, systems, and apparatus for measuring and/or controlling mass flow/concentration of a catalytically reactive gas within a mixed gas stream by determining thermal rise due to decomposition.

System, device, and method for controlling mass flow of a catalytically reactive gas in a mixed gas stream

Compositions, methods, devices, and systems for purifying a source liquid from a replenishment stock solution that includes stabilizing agents, such as metal ions, prior to vaporization. Certain embodiments effect the purification with a solid perfluoronated ionomer, such as a perfluoronated ionomer membrane. Advantageously, source liquids purified in this manner provide feed stocks for production of ultra-pure gaseous reagents. As well, performance characteristics of membrane-based vaporizers relying on transport processes are improved.

Methods and systems for purifying hydrogen peroxide solutions

A method and chemical delivery system and device are provided. One method useful in the present invention includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device useful in the present invention includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a process carrier gas and/or vacuum. One device useful in the present invention includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, in fluid communication with a permeable or semi-permeable membrane from which the volatile process chemical can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a process carrier gas or vacuum and delivering the process chemical to a critical process or application. The system further includes a carrier gas and/or vacuum in fluid contact with the vapor phase and an apparatus for delivering a gas stream comprising at least one component of the solution comprising at least one process chemical to a critical process or application.

Devices, systems, and methods for controlled delivery of process gases

A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.

Method, system, and device for delivery of process gas

Methods and delivery systems for providing a gas phase of a multi-component liquid source for delivery to a critical process application are provided. The methods include concentration of a component of the liquid source which is less volatile than water for delivery of a gas stream comprising the less volatile component to a critical process application. Critical process applications include decontamination and microelectronic processing applications.

Methods and systems for delivering process gases to critical process applications

Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.

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Bonita, CA, United States of America

Christopher Ramos