Alliance for Sustainable Energy, LLC

Christopher Paul Muzzillo

Lance Michael Wheeler

Colin A Wolden

Matthew O Reese

Kevin Joseph Prince

Mirzojamshed M Mirzokarimov

Disclosed herein are methods for using cracked film lithography (CFL) for patterning transparent conductive metal grids. CFL can be vacuum- and Ag-free, and it forms more durable grids than nanowire approaches.

High-performance metal grids for solar cells formed by cracked film lithography

The present disclosure relates to a device that includes an irregular network of interconnected ridges in physical contact with a planar substrate and a perovskite layer, where the planar substrate include a support layer and a first charge selective contact layer, the first charge selective contact layer is positioned between the support layer and the interconnected ridges, each ridge includes a second charge selective contact layer and an insulating layer, the insulating layer is positioned between the first charge selective contact layer and the second charge selective contact layer, and the perovskite layer substantially covers the plurality of interconnected ridges and the underlying planar substrate.

Growing community of inventors

Evergreen, CO, United States of America

Christopher Paul Muzzillo