Varian Semiconductor Equipment Associates, Inc.

Christopher Lupoli

Joshua R Conahan

Michael J Blanchard

Nevin H Clay

Frank Sinclair

William Davis Lee

Shengwu Chang

Klaus Becker

James Alan Pixley

Daniel McGillicuddy

Sheri A Durgin

Victor J Theriault

A cleaning tool for cleaning a glass surface of an accelerator column is disclosed. The cleaning tool includes a shaft including a first end and a second end; a foam body located at the first end of the shaft; and a mounting bracket coupled to the first end of the shaft, the mounting bracket receiving the foam body. An outer circumference of the foam body includes a textured cleaning surface for contacting the glass surface of the accelerator column.

System and tool for cleaning a glass surface of an accelerator column

An apparatus may include a shaft and a base, where the base is affixed to a first end portion of the shaft, the base comprising a first end and a second end. The apparatus may further include a first end effector, where the first end effector is rotatably coupled to the first end of the base, wherein the first end effector is rotatable from a first closed position to a first open position. The apparatus may include a second end effector, where the second end effector is rotatably coupled to the second end of the base, wherein the second end effector is rotatable from a second closed position to a second open position. The apparatus may also include a spring, including a first spring end coupled to the first end effector, and a second spring end, coupled to the second end effector.

System and tool for manipulating insert

An electrode for manipulating an ion beam. The electrode may include an insert having an ion beam aperture to conduct the ion beam therethrough, the insert comprising a first electrically conductive material; a frame disposed around the insert and comprising a second electrically conductive material; and an outer portion, the outer portion disposed around the frame and comprising a third electrically conductive material, wherein the insert is reversibly detachable from the frame, and wherein the frame is reversibly attachable from the outer portion.

Electrode, accelerator column and ion implantation apparatus including same

A tandem accelerator and ion implanter with improved performance is disclosed. The tandem accelerator includes a plurality of input electrodes, a plurality of output electrodes and a high voltage terminal disposed therebetween. The high voltage terminal includes a stripper tube. Neutral molecules are injected into the stripper tube, which remove electrons from the incoming negative ion beam. The resulting positive ions are accelerated toward the plurality of output electrodes. To reduce the amount of undesired positive ions that exit the stripper tube, bias electrodes is disposed at the entrance and exit of the stripper tube. The bias electrodes are biased a second voltage, greater than the first voltage applied to the terminal. The bias electrodes repel slow moving positive ions, preventing them from exiting the stripper tube and contaminating the workpiece.

Bias electrodes for tandem accelerator

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Exeter, NH, United States of America

Christopher Lupoli