Other

Christopher L Claypool

Emad S Zawaideh

A system and method for measurement of high aspect ratio through silicon via structures. A preferred embodiment includes a white light source and optical components adapted to provide a measurement beam which is nearly collimated with a measurement spot size of the same order of magnitude as the diameter (or effective diameter) of the TSV. These embodiments include a white light source with a variable aperture and other optical components chosen to control the angular spectrum of the incident light. In preferred embodiments the optical components include an automated XYZ stage and a system controller that are utilized to direct the illumination light so as to illuminate the top and bottom of TSV under analysis.

System and method for measurement of through silicon structures

A robust multichannel SPR instrument with exceptionally high sensitivity (&#x3c;pg/mm). The instrument utilizes an SPR detection scheme providing multiple reflections from a planar light guide configuration to amplify the reflected light intensity changes near the resonance angle. This SPR approach is amenable to simultaneous multichannel detection while maintaining high sensitivity with a simple, cost-effective design. The idea of using multiple reflections to excite multiple surface plasmon waves seems counterintuitive at first because the SPR resonance will be broadened; the broadened resonance will diminish sensitivity for angle or wavelength detection modes. However, changes in reflected light intensity near the resonance angle will be amplified by the multiple reflections, thereby increasing the sensitivity of SPR utilizing intensity detection at a fixed angle of incidence.

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Carlsbad, CA, United States of America

Christopher L Claypool