Asml Holding N.v.

Asml Netherlands B.v.

Other

Branding Brand, Inc.

Christopher John Mason

Justin Lloyd Kreuzer

Harry Sewell

Matthew Lipson

Andrew W McCullough

Michael L Nelson

Peter L Filosi

Sebastian Dovenor

Schuyler Evar Eckstrom

Daniel Scott Fitzpatrick

Damoon Sohrabibabaheidary

Nitin Mittal

Christina Koshzow

Marcus Adrianus Van De Kerkhof

Arno Jan Bleeker

Johannes Hubertus Josephina Moors

Duan-Fu Stephen Hsu

Azat M Latypov

Samir A Nayfeh

Sebastianus Adrianus Goorden

Simon Reinald Huisman

Michael Perry

Louis John Markoya

Sherman K Poultney

Igor Matheus Petronella Aarts

Jimmy Matheus Wilhelmus Van De Winkel

Krishanu Shome

Bert Dirk Scholten

Tamer Mohamed Tawfik Ahmed Mohamed Elazhary

Arthur Winfried Eduardus Minnaert

Todd R Downey

Mehmet Ali Akbas

David Hart Peterson

Victor Antonio Perez-Falcon

Yuxiang Lin

Tammo Uitterdijk

Irit Tzemah

Daniel Leslie Hall

Louis Markoya

Tian Gang

Janardan Nath

Luis Markoya

Peter Helmus

Jerry Jianguo Deng

Vu Quang Tran

A method for source mask optimization or mask only optimization used to image a pattern onto a substrate. The method includes determining a non-uniform illumination intensity profile for illumination; and determining one or more adjustments for the pattern based on the non-uniform illumination intensity profile until a determination that features patterned onto a substrate substantially match a target design. The non-uniform illumination intensity profile may be determined based on an illumination optical system and projection optics of a lithographic apparatus. In some embodiments, the lithographic apparatus includes a slit, and the non-uniform illumination profile is a through slit non-uniform illumination intensity profile. Determining the one or more adjustments for the pattern may include performing optical proximity correction, for example.

Optimization using a non-uniform illumination intensity profile

Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.

Lithographic apparatus and electrostatic clamp designs

A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.

Method to manufacture nano ridges in hard ceramic coatings

An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.

Alignment sensor apparatus for process sensitivity compensation

A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.

Substrates and methods of using those substrates

Computer systems and computer-implemented methods for transcoding websites adapted for viewing on a personal computer to websites adapted for viewing on a mobile device are disclosed. A computer-implemented transcoding method is implemented on a website server. The computer-implemented transcoding method includes handling a request, selecting a controller, generating a response, and returning the response.

Method and system for optimally transcoding websites

A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

Method and system for improving focus accuracy in a lithography system

A system and method include a pattern generating portion that is used to pattern an object via a projection system. The pattern generating portion includes active and inactive areas. The pattern generating portion patterns light traveling towards the active areas and the projection system projects the patterned light onto the object. The pattern generating portion directs light traveling towards inactive areas away from the object.

System and method to block unwanted light reflecting from a pattern generating portion from reaching an object

A maskless lithography tool that includes a reference reticle having reference features for tuning and calibrating the tool. The reference reticle is illuminated by a illumination source to form a reference image of the reference features. A signal is applied to an active contrast device of the tool to form a die pattern that includes the reference features. The contrast device is illuminated by the illumination source to form a die image of reference features. An image scanner captures the reference image and the die image. A comparison of the images is used to make tuning and calibrating adjustments to the tool. The reference reticle can be used to debug and characterize the tool even when the operation of the contrast device is not completely understood because the reference features of the reference reticle are independent of the tool's contrast device and pattern generating data stream.

System and method for verifying and controlling the performance of a maskless lithography tool

The present invention provides systems and methods for maskless lithographic printing that compensate for static and/or dynamic misalignments and deformations. In an embodiment, a misalignment of a pattern formed by a spatial light modulator is measuring during printing. Rasterizer input data is generated based on the measured misalignment and passed the rasterizer. The rasterizer generates pattern data, based on the rasterizer input data, that is adjusted to compensate for the measured misalignment. The pattern data generated by the rasterizer is passed to the spatial light modulator and used to form a second pattern, which includes compensation for the measured misalignment. In an embodiment, deformations caused, for example, by a warping a surface of the spatial light modulator are measured and used by the rasterizer to generate pattern data that compensates for the deformations.

System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool

Method and systems for improving focus accuracy in a lithography system

A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used. In another embodiment, the reticle stage has a range of motion permitting scanning of an additional calibration reticle. This permits rapid real time system calibration.

Use of multiple reticles in lithographic printing tools

Growing community of inventors

Newtown, CT, United States of America

Christopher John Mason