International Business Machines Corporation

Christopher John Knors

Wayne Martin Moreau

Elwood Herbert Macy

Ratnam Sooriyakumaran

Hiroshi Ito

Gregory Breyta

Melvin W Montgomery

William R Brunsvold

Kevin Michael Welsh

Randolph J Smith

Steve S Miura

Martin Moreau

A composition and methods for the use and manufacture thereof are provided for a polymeric dye. The composition comprises one or more aminoaromatic chromophores in conjunction with polymers having an anhydride group or the reaction products thereof. The composition is particularly useful as an underlaying antireflective coating with microlithographic photoresists for the absorbtion of near or deep ultraviolet radiation.

Polymeric dyes for antireflective coatings

The present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with acrylate, methacrylate or a mixture of acrylate and methacrylate.

Photoresist composition

Positive photoresist compositions and methods using the photoresist compositions for making submicron patterns in the production of semiconductor devices are disclosed. The photoresists contain sensitizers that are mixed naphthoquinonediazide 4- and 5- sulfonic acid esters of bis and tris(mono, di and trihydroxyphenyl) alkanes.

Fast diazoquinone positive resists comprising mixed esters of

Acid sensitized photoresists with enhanced photospeed are provided. The photoresist compositions include a polymer binder and/or a polymerizable compound and an acid sensitive group which enables patterning of the resist composition, and acid generating photoinitiator, and an hydroxy aromatic compound which enhances the speed of the resist composition under imaging radiation.

Speed enhancers for acid sensitized resists

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Bound Brook, NJ, United States of America

Christopher John Knors