Other

Diamond Semiconductor, Inc.

Direction Incorporated

Christopher John Bayne

Stephen Barker

H Chris Guiver

Harold C Guiver

The Trike's unique power source is provided by a rowing-type motion of the user rather than the less efficient 'hand rim' grip or wrist propulsion. The rowing motion significantly reduces the chances for repetitive stress injuries, like carpal tunnel. Furthermore, the rowing motion and movements, are designed to facilitate efficient propulsion and steering in combination, to be effected simultaneously. The rowing motion allows the user's full arm strength and full range of motion to assist in the powering of the vehicle. The wheelchair also has a retractable fifth or propulsion wheel that allows the chair to be used in a confined space without sacrificing performance.

Ergonomically improved rowing motion-propelled convertible wheelchair using retractible fifth wheel

The present invention comprises a fully automated, fabrication compliant furnace with the advantages of the horizontal and most of the advantages of the vertical furnace. One embodiment of the present invention is that it implements a multi-degree motion robot arm to move wafers from a loading area to a WIP station where the wafers are then loaded into wafer boats on a rotating cantilever system or directly onto a specialized and reconfigurable paddle designed to hold wafers. The wafers may be loaded in the horizontal processing position as well as the vertical processing position. Multiple levels of the semi-toroidal horizontal processors allow for multiple batches of wafers to be loaded, processed, cooled and unloaded by the robot arm. The present invention reduces the footprint of the traditional horizontal or vertical furnaces, increases capacity and throughput, and allows for direct tube transfer.

Versatile semi-toroidal processing furnace with automatic and reconfigurable wafer exchange

A portable assembly allows semiconductor wafer boats to be transported safely from one semiconductor processing device to another semiconductor processing device at low cost using a small amount of the fabrication area without the need for complicated automated systems. The portable assembly includes two hollow bodies, of which one body may be elevated electromechanically to the height of a cantilever oven opening. The elevation may be conducted manually or automatically. The upper body of the assembly contains a rotating drum which further includes four segmented cylinders, which store and queue the wafer boats. The lower body contains a safety shoe locking apparatus which allows the elevator mechanism to be activated only when the assembly is docked in the appropriate location. The assembly also contains storage areas for wafers in progress. The assembly is moved manually on a set of wheels and may be rotated about its axis.

Mobile elevator transporter for semi-automatic wafer transfer

A controlled diffusion environment capsule system (10) is used with a conventional tubular high temperature furnace (12) as employed in semiconductor manufacturing. The system (10) includes a cantilever boat loading apparatus (14) and a quartz diffusion capsule (16). Wafer carriers (20) support semiconductor wafers (22) concentrically with capsule (16) in closely spaced relationship for processing in the furnace (12). The diffusion capsule (16) is supported on a pair of quartz rods (24). A quartz injector tube (28) extends the length of the diffusion capsule (16). The injector tube (28) has three rows of high aspect-ratio apertures (30) extending along its length to disperse nitrogen or other inert gas uniformly across the sufaces (32) of the wafers (22). A quartz extender (34) is connected to the distal end of the diffusion capsule (16), through which reactant gases are supplied to the capsule (16) for diffusion and/or oxidation, from an inlet source (35) of the reactant gases on the furnace tube near the extender (34). The extender (34) has two apertured baffle plates (36) and (38) which have holes (40) and (42) in patterns that are offset relative to one another. A third plate (44) has a larger hole (46) at its center. The hole (46) focuses reactant gases into the capsule and the holes (40) and (42) provide turbulence to the reactant gas stream prior to its entry into the capsule (16) to assure uniform mixing.

Controlled diffusion environment capsule and system

A controlled diffusion environment capsule system (10) is used with a conventional tubular high temperature furnace (12) as employed in semiconductor manufacturing. The system (10) includes a cantilever boat loading apparatus (14) and a quartz diffusion capsule (16). Wafer carriers (20) support semiconductor wafers (22) concentrically with capsule (16) in closely spaced relationship for processing in the furnace (12). The diffusion capsule (16) is supported on a pair of quartz rods (24). A quartz injector tube (28) extends the length of the diffusion capsule (16). The injector tube (28) has three rows of high aspect-ratio apertures (30) extending along its length to disperse nitrogen or other inert gas uniformly across the surfaces (32) of the wafers (22). A quartz extender (34) is connected to the distal end of the diffusion capsule (16), through which reactant gases are supplied to the capsule (16) for diffusion and/or oxidation, from an inlet source (35) of the reactant gases on the furnace tube near the extender (34). The extender (34) has two apertured baffle plates (36) and (38) which have holes (40) and (42) in patterns that are offset relative to one another. A third plate (44) has a larger hole (46) at its center. The hole (46) focuses reactant gases into the capsule and the holes (40) and (42) provide turbulence to the reactant gas stream prior to its entry into the capsule (16) to assure uniform mixing.

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Los Gatos, CA, United States of America

Christopher John Bayne