Average Co-Inventor Count = 3.27
ph-index = 4
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. United States of America As Represented by the Administrator of Nasa (19 from 2,448 patents)
2. The United States of America As Represented by the Administrator of the (1 from 2,546 patents)
20 patents:
1. 11760738 - Anisotropic copoly(imide oxetane) coatings and articles of manufacture, copoly(imide oxetane)s containing pendant fluorocarbon moieties, oligomers and processes therefor
2. 11746183 - Durable contamination resistant coatings
3. 11149165 - Coatings with molecular flexibility for ice adhesion mitigation
4. 11130742 - Anisotropic copoly(imide oxetane) coatings and articles of manufacture, copoly(imide oxetane)s containing pendant fluorocarbon moieties, oligomers and processes therefor
5. 10899045 - High pressure soft lithography for micro-topographical patterning of molded polymers and composites
6. 10899937 - Hydrogen-bonding surfaces for ice mitigation
7. 10808079 - Synthesis of copolyimides containing fluorine and silicon surface modifying agents
8. 10723912 - Synthesis and development of polyurethane coatings containing flourine groups for abhesive applications
9. 10669360 - Dye doped polymer microparticles
10. 10626098 - Anisotropic copoly(imide oxetane) coatings and articles of manufacture, copoly (imide oxetane)s containing pendant fluorocarbon moieties, oligomers and processes therefor
11. 10549516 - Off-set resin formulations and blocking/deblocking resin systems for use as a 'co-cure-ply' in the fabrication of large-scale composite structure
12. 10501840 - Influence on surface interactions by substructure topography
13. 10377916 - Coatings with molecular flexibility for ice adhesion mitigation
14. 10369767 - Blocking/deblocking resin systems for use as a 'co-cure-ply' in the fabrication of large-scale composite structure
15. 10259077 - Modification of surface energy via direct laser ablative surface patterning