Lawrence Livermore National Security, LLC

The United States of America As Represented by the Department of Energy

Colorado State University Research Foundation

Christopher J Stolz

Paul B Mirkarimi

Carmen Menoni

Regina Soufli

Christopher Charles Walton

Dinesh Patel

Justin Wolfe

Hoang Tan Nguyen

James Allen Folta

Eyal Feigenbaum

Jeffrey Devin Bude

Jean-Michel Di Nicola

Hoang T Nguyen

Robert Huber

Zhouling Wu

Jim Folta

Carolyn Weinzapfel

Diane Chinn

Christopher C Walton

James A Folta

Justin E Wolfe

The present disclosure relates to a waveplate having a substrate forming an optic. The substrate may have an integral portion forming a plurality of angled columnar features on an exposed surface thereof. The plurality of angled columnar features may further be aligned parallel with a directional plane formed non-parallel to a reference plane, with the reference plane being normal to a surface of the substrate. The metasurface forms a birefringent metasurface.

Birefringent waveplate and method for forming a waveplate having a birefringent metasurface

A method of making a laser mirror in which a mirror substrate has at least a one micron size nodular defect includes depositing a planarization layer over the mirror substrate and the nodular defect, depositing a layer of silicon dioxide over the planarization layer, and etching away a portion of the layer of silicon dioxide. The method also includes thereafter, depositing a layer of hafnium dioxide over the layer of silicon dioxide and repeating the steps of depositing a layer of silicon dioxide, etching away a portion of the layer of silicon dioxide, and depositing a layer of hafnium dioxide until the nodular defect is reduced in size a predetermined amount.

Planarization of optical substrates

Planarization of defects in laser mirror and other optical component manufacture is disclosed. The planarization is performed by first depositing a relatively thick planarization layer, then carrying out a sequential deposition and etch process. The technique takes advantage of the non-uniform material removal rate as a function of etchant incident angle, and effectively buries the inclusion in a thick film with a near planar top surface. The process enables faster, more reliable manufacture of a non-defective high fluence multilayer mirror particularly suitable for high energy laser applications.

Photothermal Imaging Scanning Microscopy produces a rapid, thermal-based, non-destructive characterization apparatus. Also, a photothermal characterization method of surface and subsurface features includes micron and nanoscale spatial resolution of meter-sized optical materials.

Photothermal imaging scanning microscopy

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Lathrop, CA, United States of America

Christopher J Stolz