Molecular Imprints, Inc.

Christopher J Mackay

Van Nguyen Truskett

Frank Y Xu

Edward Brian Fletcher

Michael P C Watts

Ian Matthew McMackin

Pankaj B Lad

Nicholas A Stacey

David C Wang

Wesley D Martin

B Jin Choi

The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.

Method to provide a layer with uniform etch characteristics

The present invention provides a method to reduce adhesion between a polymerizable layer and a substrate surface that selectively comes into contact with the polymerizable layer. The method features disposing a coating upon the surface from a composition having a perfluoro silane containing molecule. The perfluoro silane molecule is connected to bonding regions on the surface forming covalent bonding groups, as well as contact regions. The contact regions include fluorinated chains of molecules. The covalent bonding groups are positioned between the surface and the contact regions. The perfluoro silane containing molecule may be applied to the surface as a monomolecular layer from a di-functional perfluoro silane molecule. Exemplary molecules that may be employed as the perfluoro silane containing molecule includes molecules sold under the trade-names FLUOROSYL&#x2122; FSD 2500 and FLUOROSYL&#x2122; FSD 4500.

Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer

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Austin, TX, United States of America

Christopher J Mackay