E.i. Dupont De Nemours and Company

Dupont Teijin Films U.S. Limited Partnership

Christopher Ferguson

Fredrick Claus Zumsteg, Jr

Robert William Eveson

Richard P Pankratz

Thomas C Felder

Moira Logan

James R Joiner

Debra S Strickland

Richard Paul Pankratz

A donor element useful in an assemblage for imaging by exposure to light comprises a support layer, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The donor element also includes a release-modifier disposed between the support layer and the transfer layer.

Donor element with release-modifier for thermal transfer

A donor element useful in an assemblage for imaging by exposure to light comprises a support layer formed by a stretching process, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The light-to-heat conversion layer is coated on the support prior to completion of the stretching process.

Donor element for thermal transfer

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Hartlepool, United Kingdom

Christopher Ferguson