Aviza Technology Limited

Spp Process Technology Systems UK Limited

Christopher David George

Gary Proudfoot

Gordon R Green

Robert Kenneth Trowell

Paulo Edurado Lima

Paulo Eduardo Lima

This invention relates to a broad beam ion deposition apparatus () including an ion source (), a target (), a tillable substrate table () and an auxiliary port (). The target () is in the form of a carousel which carries a number of targets and the ion source () is configured to produce a substantially rectangular section beam ().

Ion deposition apparatus having rotatable carousel for supporting a plurality of targets

This invention relates to a plasma source in the form of plasma generator () which utilizes an antenna () and an RF source (). The generated plasma flows into a chamber () and ions are accelerated out of the chamber () by grid (). A bodyis located in the volume for creating local losses and thereby reducing local plasma density.

Plasma sources

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Bristol, United Kingdom

Christopher David George