Central Japan Railway Company

Tokyo Ohka Kogyo Co., Ltd.

Christopher Cordonier

Tetsuya Shichi

Akira Fujishima

Yasuhiro Katsumata

Kenichi Katsumata

Akimasa Nakamura

Takafumi Numata

Teruo Komine

Kenichirou Amemiya

Makoto Yamashita

Toshiyuki Ogata

Takayoshi Sasaki

Motoki Takahashi

Teruhiro Uematsu

Disclosed is a method for forming a photocatalyst thin film, which is characterized in that a photocatalyst thin film containing a niobium-alkali metal complex oxide is formed by forming and then firing a layer containing niobium on the surface of a base containing an alkali metal.

Photocatalytic film, method for forming photocatalytic film and photocatalytic film coated product

Disclosed is a method for forming a photocatalyst thin film, which is characterized in that a photocatalyst thin film containing a niobium-alkali metal complex oxide is formed by forming and then firing a layer containing a niobia nanosheet on the surface of a base containing an alkali metal.

A coating liquid including one or more of metal complexes selected from a metal complex A represented by Chemical Formula 1, a metal complex B represented by Chemical Formula 2, and a metal complex C represented by Chemical Formula 3. M in Formula 1, 2 and 3 represents a metal ion. Each of X-Xin Formula 1, 2 and 3 is one of O, NH, COand S. Each of Y-Yin Formula 1 and Y-Yin Formula 3 is either CH or N. Each of Z-Zin Formula 2 and 3 and Z-Zin Formula 2 is one selected from a group of O, NH and S, and two selected from a group of CH and N. L represents an axial ligand. k represents a valence of each of the metal complexes and is equal to a sum of electric charges of M, X-Xand L.

Coating liquid, metal compound film formed by coating liquid, and forming method thereof

Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.

Positive-type photosensitive composition

The present invention provides a technology related to a conductive film which is high in transparency, conductivity, and adhesiveness to a base plate. The present invention also provides a coating liquid including metal materials reacting with a ligand represented by a particular Chemical Formula and including indium (In), tin (Sn), or both thereof.

Coating liquid, conductive film formed by coating liquid, and forming method thereof

The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R-Rin Chemical Formula 1 is one of the followings (1)-(4):

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Aichi, Japan

Christopher Cordonier