Asml Netherlands B.v.

Asml Holding N.v.

Gm Cruise Holdings LLC

Skyryse, Inc.

Christopher Charles Ward

Mark Josef Schuster

Frank Johannes Jacobus Van Boxtel

Daniel Nathan Burbank

Johannes Onvlee

Peter A Delmastro

Samir A Nayfeh

Justin Matthew Verdirame

Daniel Nicholas Galburt

Laurentius Johannes Adrianus Van Bokhoven

Ruud Hendrikus Martinus Johannes Bloks

Mark Groden

Mitch Adler

Earl William Ebert

Nur Harell

Abdullah Alikhan

Jonathan R Reeves

Martinus Hendrikus Antonius Leenders

Jan Steven Christiaan Westerlaken

Curt Harrington

Jean-Philippe Xavier Van Damme

Christopher Daily-Diamond

Ted Nitz

Geoffrey Alan Schultz

Erik Roelof Loopstra

Thibault Simon Mathieu Laurent

Hakki Ergün Cekli

Christiaan Louis Valentin

Lowell Lane Baker

Thomas Venturino

Stephen Roux

Johan Gertrudis Cornelis Kunnen

Herman Vogel

Bearrach Moest

Koen Cuypers

Marinus Jan Remie

Robertus Nicodemus Jacobus Van Ballegoij

Adrianus Martinus Van Der Wielen

Arindam Sinharoy

Saranya Konala

Marc Léon Van Der Gaag

Mark Henricus Wilhelmus Van Gerven

Santiago E Delpuerto

Nikola Noxon

Marcelo Henrique De Andrade Oliveira

Chattarbir Singh

Henricus Anita Jozef Wilhemus Van De Ven

José Nilton Fonseca Junior

Peter James Graffeo

Duncan Harris

Bram Paul Theodoor Van Goch

Travis McCawley

Güneş Nak{dot Over (i)}boglu

Travis Reese Mccawley

Güneş Nakíboglu

Systems and methods are provided for determining a required following behavior when a road actor or vehicle cuts in front of an autonomous vehicle. The appropriate following behavior depends on various factors including road and weather conditions, recovery time gap, minimum time gap for the autonomous vehicle speed, distance between the autonomous vehicle and cut-in vehicle, speed of the autonomous vehicle at the time of cut-in, speed of the cut-in vehicle, time to collision threshold for hard braking, and time to collision threshold for normal braking. Types of following behaviors include emergency deceleration, aggressive deceleration, moderate deceleration, recovery deceleration, some deceleration or following without deceleration. In some examples, the recovery time gap can be set to 3 or more seconds. In some examples, it is set to below 3 seconds. As the recovery time gap increases, the following distance between the autonomous vehicle and a leading vehicle increases.

Algorithm for the AV to safely respond to a cut-in vehicle

Methods and systems are provided for detecting and responding to dangerous road users. In some aspects, a process can include steps for receiving sensor data of a detected object from an autonomous vehicle, determining whether the detected object is exhibiting a dangerous attribute, generating output data based on the determining of whether the detected object is exhibiting the dangerous attribute, and updating a machine learning model based on the output data relating to the dangerous attribute.

Dangerous road user detection and response

A method, preferably including: sampling inputs, determining aircraft conditions, and/or acting based on the aircraft conditions. A method, preferably including: sampling inputs, determining input reliability, determining guidance, and/or controlling aircraft operation. A method, preferably including: operating the vehicle, planning for contingencies, detecting undesired flight conditions, and/or reacting to undesired flight conditions. A system, preferably an aircraft such as a rotorcraft, configured to implement the method.

Situational awareness, vehicle control, and/or contingency planning for aircraft actuator failure

An autonomous vehicle is configured to estimate a change in direction of a vehicle that is on a roadway and is proximate to the autonomous vehicle. The autonomous vehicle has a mechanical system, one or more sensors that generate one or more sensor signals, and a computing system in communication with the mechanical system and the one or more sensors. The autonomous vehicle is configured to detect an imminent lane change by another vehicle based on at least one of a computed angle between a wheel of the other vehicle and a longitudinal direction of travel of the other vehicle, a degree of misalignment between the wheel of the other vehicle and a body of the other vehicle, and/or an eccentricity of the wheel of the other vehicle. The mechanical system of the autonomous vehicle is controlled by the computing system based upon the detected imminent lane change.

Controlling an autonomous vehicle based upon a predicted imminent lane change

An autonomous vehicle is described, wherein the autonomous vehicle is configured to estimate a change in direction of a vehicle that is on a roadway and is proximate to the autonomous vehicle. The autonomous vehicle has a mechanical system, one or more sensors that generate one or more sensor signals, and a computing system in communication with the mechanical system and the one or more sensors. The autonomous vehicle is configured to detect an imminent lane change by another vehicle based on at least one of a computed angle between a wheel of the other vehicle and a longitudinal direction of travel of the other vehicle, a degree of misalignment between the wheel of the other vehicle and a body of the other vehicle, and/or an eccentricity of the wheel of the other vehicle. The mechanical system of the autonomous vehicle is controlled by the computing system based upon the detected imminent lane change.

Method for vehicle contingency planning

A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Lithographic apparatus

A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

Patterning device cooling apparatus

System and method for situational awareness, vehicle control, and/or contingency planning

An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.

Reticle cooling by non-uniform gas flow

A lithographic apparatus () includes a patterning device support structure () configured to support a patterning device (), a gas inlet () configured to provide a gas flow () across a surface of the patterning device, and a temperature conditioning device () configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor () configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume () between the patterning device and a lens () of a projection system () during operational use of the lithographic system. Further, the apparatus includes a controller () operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.

Patterning device cooling systems in a lithographic apparatus

A method, preferably including: sampling inputs, determining aircraft conditions, and/or acting based on the aircraft conditions. A method, preferably including: sampling inputs, determining input reliability, determining guidance, and/or controlling aircraft operation. A method, preferably including: operating the vehicle, planning for contingencies, detecting undesired flight conditions, and/or reacting to undesired flight conditions. A system, preferably an aircraft such as a rotorcraft, configured implement the method.

A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate () positioned between the movable stage () and the projection system (). The plate includes an opening () that comprises a first sidewall () and a second sidewall (). The plate may be configured to provide a gas flow pattern () in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Gas flow optimization in reticle stage environment

Growing community of inventors

Somerville, MA, United States of America

Christopher Charles Ward