Arkema France

Centre National De La Recherche Scientifique

Commissariat a L'energie Atomique Et Aux Energies Alternatives

Universitë De Bordeaux

Atofina

Institut Polytechnique De Bordeaux

Elf Atochem S.a.

Arkema Inc.

Cnrs

Ecole Superieure De Chimie Physique Electronique De Lyon

Université Paul Sabatier (Toulouse III)

Université Grenoble Alpes

Centre National De La Recherche Scientifique-Cnrs

Total Raffinage Marketing

Université De Bordeaux 1

Christophe Navarro

Xavier Chevalier

Celia Nicolet

Raluca Tiron

Eric Cloutet

Georges Hadziioannou

Cyril Brochon

Stephane Girois

Jean-Claude Saint-Martin

Elisabeth Bay

Robert Jerome

Didier Bourissou

Hubert Teyssedre

Stéphanie Magnet

Francois Court

Xavier Marcarian

Nicolas Posseme

Philippe Bonnet

Pierre Gerard

Ludwik Leibler

Michel Devic

Rosangela Pirri

Philippe Teyssie

Christophe Boisson

Henri Cramail

Beatrice Boussand

Frederic Malet

Vincent Monteil

Ilias Iliopoulos

Blanca Martin-Vaca

Maxime Argoud

Laurent Pain

Aline Couffin

Manuel Hidalgo

Jean-Pierre Broyer

Karim Aissou

Ahmed Gharbi

Muhammad Mumtaz

Laurent Falk

Fernand Pla

Thomas Zundel

Andreas R Maurer

Axel H E M&uuml;ller

Florian Delachat

Bianca Martin-Vaca

Guillaume Claveau

Magali Bergeret-Richaud

Marc Zelsmann

Damien Delcroix

Anne Paquet

Katerina Bethani

Guillaume Fleury

Wiljan Smaal

Christophe Couderc

Sébastien-Jun Mougnier

Stéphanie Gazeau-Bureau

Alexandra Leblanc

Peter Walzel

Sebastien-Jun Mougnier

Ahmed Mourran

Vincent Royackkers

Roger Spitz

Usein Ismailov

Sophie Mariotti

Stéphane Girois

Jean-Pascal Planche

Didier Lesueur

Gwenaëlle Pound-Lana

A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

Process for transfer imprinting

A method for the directed self-assembly of a block copolymer by graphoepitaxy, includes forming a guide pattern, the guide pattern having a cavity with a bottom and side walls; forming a functionalisation layer on the guide pattern that has a first portion and a second portion disposed, respectively, on the bottom and side walls of the cavity; forming a protective layer on the first and second portions of the functionalisation layer; etching the protective layer and the second portion of the functionalisation layer such that a portion of the protective layer is retained and the side walls of the cavity are exposed, the retained portion of the protective layer having a thickness of less than 15 nm; selectively etching the portion of the protective layer relative to the first portion of the functionalisation layer and to the guide pattern; and depositing a block copolymer in the cavity.

Method for the directed self-assembly of a block copolymer by graphoepitaxy

A method for forming a chemical guiding structure intended for self-assembly of a block copolymer by chemoepitaxy, where the method includes forming on a substrate a functionalisation layer made of a first polymer material having a first chemical affinity with respect to the block copolymer; forming on the substrate guiding patterns made of a second polymer material having a second chemical affinity with respect to the block copolymer, different from the first chemical affinity, and wherein the guiding to patterns have a critical dimension of less than 12.5 nm and are formed by means of a mask comprising spacers.

Method for forming a chemical guiding structure on a substrate and chemoepitaxy method

The present invention relates to a multistage polymer, its composition, its process of preparation, and its use as impact modifier in thermoplastic compositions. More particularly the present invention relates to a process for manufacturing a polymer composition comprising a multistage polymer and its use as impact modifier in thermoplastic compositions.

Process of manufacturing a multistage polymer, its composition, its use and composition comprising it

The invention relates to stable compositions of carbon nanotubes and of electrolytic polymers, these electrolytic polymers being characterized by the presence of phosphonyl imide or sulfonyl imide functions or alternatively phosphoric acid functions. The invention also relates to the manufacture of transparent electrodes comprising these compositions of carbon nanotubes and of electrolytic polymers.

Stable compositions of carbon nanotubes-electrolytic polymers

A method for controlling the synthesis of a block copolymer containing at least two blocks, with at least one nonpolar block and at least one polar block, said method making it possible in particular to control the ratio between the blocks and the molecular weight of each of the blocks, said copolymer being a block copolymer intended to be used as a mask in a method of nanolithography by direct self-assembly (DSA), said control being achieved by semicontinuous anionic polymerization in an aprotic nonpolar medium.

Method for controlling the synthesis of a block copolymer containing at least one nonpolar block and at least one polar block and use of said block copolymer in applications of nanolithography by direct self-assembly

The present invention relates to thermoplastic compositions comprising as impact modifier a rubber containing graft polymer prepared by the process of emulsion polymerization and recovered by a special process controlling and adjusting the pH value, the use of the thermoplastic compositions in the production of molded bodies, and to the molded, bodies themselves. The present invention relates also to thermoplastic compositions comprising a polymeric impact modifier with a core-shell structure made by a multistage process and recovered by a special process controlling and adjusting the pH value comprising at least one gradient polymer the use of the thermoplastic compositions in the production of molded bodies, and to the molded, bodies themselves.

Impact modified thermoplastic composition

The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.

Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film

The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).

Process for controlling the period of a nanostructured block copolymer film based on styrene and on methyl methacrylate, and nanostructured block copolymer film

The invention relates to a process for synthesizing poly(3,4-ethylenedioxythiophene)-electrolytic (co)polymer composite in a single step.

Process for synthesizing PEDOT-electrolytic (co)polymer

The present invention relates to a method for preparing a copolymer from at least one cyclic monomer selected from: a lactone, a lactam, a carbonate, a lactide and a glycolide, an oxazoline, an epoxide, a cyclosiloxane, comprising the step consisting of reacting said cyclic monomer in the presence of a substituted phosphorus-containing compound. It also relates to the polymer composition obtained according to this method, as well as the uses thereof, notably as antistatic additives, biocompatible materials, as membranes for treatment of effluents or in electrochemical systems for energy storage.

Method for preparing a polymer from at least one cyclic monomer

The present invention relates to new impact modifiers and a process for making these new impact modifiers and their use in polymeric compositions. More particularly the present invention relates to a new polymeric impact modifier with a core-shell structure made by a multistage polymerization process comprising at least one gradient polymer. The present invention relates as well to a process preparing such an impact modifier, especially its recovery process after the end of the polymerization. The present invention also relates to a thermoplastic composition comprising the new impact modifier.

Core shell particle multistage polymer powder, its manufacturing process

The invention concerns a manufacturing method for nanolithography masks from a PS-b-PMMA block copolymer film deposited on a surface to be etched, said copolymer film comprising PMMA nanodomains orientated perpendicularly to the surface to be etched, said method being characterized in that it comprises the following steps:

Method for manufacturing a nanolithography mask

The invention relates to novel block copolymers that enable a good dispersion of nanofillers in water and also to a dispersion of nanofillers obtained owing to these block copolymers. This dispersion may be used as a transparent electrode in organic solar cells or other photoemitter or photoreceptor devices.

Block copolymers that disperse nanofillers in water

Growing community of inventors

Bayonne, France

Christophe Navarro