Stmicroelectronics International N.v.

Stmicroelectronics (crolles 2) Sas

Stmicroelectronics France

Stmicroelectronics S.a.

Christophe Lecocq

Promod Kumar

Olivier Weber

Pascal Urard

Harsh Rawat

Kedar Janardan Dhori

Amit Chhabra

Praveen Kumar Verma

Dibya Dipti

Shafquat Jahan Ahmed

Kaya Can Akyel

In one embodiment, a semiconductor device includes a carrier substrate, a buried dielectric region overlying the carrier substrate, and a semiconductor film separated from the carrier substrate by the buried dielectric region. NMOS transistors and PMOS transistors are disposed at a surface of the semiconductor film and coupled together to form a static random access memory (SRAM) cell. The NMOS transistors and the PMOS transistors each include a gate dielectric layer having a thickness greater than three nanometers and an active region in the semiconductor film. The active region of the PMOS transistors are formed from a silicon-germanium alloy.

Silicon-on-insulator semiconductor device with a static random access memory circuit

A memory circuit includes an array of memory cells arranged with first word lines connected to a first sub-array storing less significant bits of data and second word lines connected to a second sub-array storing more significant bits of data. A row decoder circuit coupled to the first and second word lines generates word line signals. A word line gating circuit is configured to selectively gate passage of the word line signals to the second word lines for the second sub-array in response to assertion of a maximum value signal. A data modification circuit performs a mathematical operation on data read from the array of memory cells, and asserts the maximum value signal if the mathematical operation performed on the less significant bits of data from the first sub-array produces a maximum data value.

Modular memory architecture with gated sub-array operation dependent on stored data content

An integrated circuit includes at least a first standard cell framed by two second standard cells. The three cells are disposed adjacent to each other, and each standard cell includes at least one NMOS transistor and at least one least one PMOS transistor located in and on a silicon-on-insulator substrate. The at least one PMOS transistor of the first standard cell has a channel including silicon and germanium. The at least one PMOS transistor of each second standard cell has a silicon channel and a threshold voltage different in absolute value from the threshold voltage of said at least one PMOS transistor of the first cell.

Set of integrated standard cells

An SRAM cell is formed of FDSOI-type NMOS and PMOS transistors. A doped well extends under the NMOS and PMOS transistors and is separated therefrom by an insulating layer. A bias voltage is applied to the doped well. The applied bias voltage is adjusted according to a state of the memory cell. For example, a temperature of the memory cell is sensed and the bias voltage adjusted as a function of the sensed temperature. The adjustment in the bias voltage is configured so that threshold voltages of the NMOS and PMOS transistors are substantially equal to n and p target threshold voltages, respectively.

Method of minimizing the operating voltage of an SRAM cell

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Varces, France

Christophe Lecocq