Asml Netherlands B.v.

Christophe De Metsenaere

Paul Petrus Joannes Berkvens

Michel Riepen

Paulus Martinus Maria Liebregts

Koen Steffens

Ronald Van Der Ham

Wilhelmus Franciscus Johannes Simons

Marcio Alexandre Cano Miranda

Han Henricus Aldegonda Lempens

Patrick Johannes Wilhelmus Spruytenburg

Joris Johan Anne-Marie Verstraete

Franciscus Johannes Joseph Janssen

Gert-Jan Gerardus Johannes Thomas Brands

Mathieus Anna Karel Van Lierop

Christiaan Alexander Hoogendam

Daniel Jozef Maria Direcks

Jimmy Matheus Wilhelmus Van De Winkel

Eva Mondt

Nicolaas Rudolf Kemper

Cornelius Maria Rops

Marcus Martinus Petrus Adrianus Vermeulen

Robertus Nicodemus Jacobus Van Ballegoij

Daniël Jozef Maria Direcks

Martinus Wilhelmus Van Den Heuvel

Johannes Henricus Wilhelmus Jacobs

Roelof Frederik De Graaf

Ruud Hendrikus Martinus Johannes Bloks

Gregory Martin Mason Corcoran

Hrishikesh Patel

Ronald Casper Kunst

Paul William Scholtes-Van Eijk

Matheus Anna Karel Van Lierop

Mauritius Gerardus Elisabeth Schneiders

Gert-Jan Geradus Johannes Thomas Brands

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Fluid extraction system, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.

Immersion lithographic apparatus including a pressure sensor to measure pressure of the immersion liquid and a device manufacturing method

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

Fluid handling structure, lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Christophe De Metsenaere