Freescale Semiconductor,inc.

Koninklijke Philips Corporation N.V.

Stmicroelectronics (crolles 2) Sas

Christophe Couderc

Kevin Dean Lucas

Kyle W Patterson

James Edward Vasek

Robert Elliott Boone

William Louis Wilkinson

Yves Rody

Corinne Miramond-Collet

Method and apparatus for designing an integrated circuit by adding a plurality of control points to an integrated circuit wafer design. Each control point has at least one attribute. Then, an integrated circuit wafer is manufactured using the integrated circuit wafer design. A defect on the integrated circuit wafer is then located. The control points are adjusted such that they correspond with the defect.

Method and apparatus for designing and integrated circuit

For cases where one edge of a design feature is to be printed through a shifter mask and another one is to be printed through a binary trim mask, and where no upsizing can be performed due to the local density of the design, it is proposed to add shifters with respect to the shifter mask in such a way that all the edges are printed by the phase shift mask.

Printing of design features using alternating PSM technology with double mask exposure strategy

Growing community of inventors

Eindhoven, Netherlands

Christophe Couderc