Carl Zeiss Nts Gmbh

Carl Zeiss Multisem Gmbh

Christoph Riedesel

Rainer K Knippelmeyer

Lawrence Scipioni

John Morgan

Dirk Zeidler

Ulrich Mantz

Ulrich Wagemann

A charged particle beam system includes a charged particle source, a multi beam generator, an objective lens, a projection system, and a detector system. The projection system includes a first subcomponent configured to provide low frequency adjustments, and the projection system comprises a second subcomponent configured to provide a high frequency adjustments.

Charged particle beam system and method

A first instrument () is used to image a first semiconductor article having a trench () of defined cross-section, while a second instrument () is used to simultaneously prepare a second semiconductor article with a trench of defined cross-section. Furthermore, a method is disclosed to prepare a trench () of defined cross-section in a semiconductor article by rough milling and subsequent fine milling.

Cross-section systems and methods

Methods and systems for defect repair are disclosed. The methods include: (a) identifying a defect causing an absence of an electrical connection between a first circuit element and a second circuit element, the first and second circuit elements being positioned in or on a substrate and the defect being positioned in the substrate; (b) removing a portion of the substrate to expose the defect, and depositing a conductive material to electrically connect the first and second circuit elements; and (c) verifying that the defect caused the absence of an electrical connection between the first and second circuit elements.

Repairing defects

Growing community of inventors

Aalen, Germany

Christoph Riedesel