Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Federal-mogul Wiesbaden Gmbh

Federal-mogul Wiesbaden Gmbh & Co. Kg

Ctf Solar Gmbh

Ferderal-mogul Wiesbaden Gmbh & Co. Kg

Christoph Metzner

Klaus Goedicke

Gerd Andler

Jens-Peter Heinss

Siegfried Schiller

Volker Kirchhoff

Bert Scheffel

Torsten Werner

Olaf Zywitzki

Jonathan Reschke

Henry Morgner

Wolfgang Hempel

Daniel Hirsch

Torsten Kopte

Fred Fietzke

Uwe Vogel

Bernd Richter

Bastian Siepchen

Jörg Kubusch

Philipp Wartenberg

Nicolas Schiller

Gösta Mattausch

Michael Steeg

Krishnakumar Velappan

Christian Drost

Karsten Fehse

Rainer Labitzke

Bettina Späth

Joerg Schmidt

Beatrice Beyer

Stefan Saager

Christian Kraft

Wolfgang Wixwat-Ernst

Elisabeth Bodenstein

Ullrich Heisig

Mario Metzner

Matthias Schober

Susan Mühl

Michael Junghähnel

Ludwig Decker

Thomas Modes

Lars Klose

Lars Werner

A method for depositing a CdTe layer on a substrate in a vacuum chamber by means of physical gas phase deposition is provided. The substrate is heated to a coating temperature before the deposition process and then guided past a vessel in which CdTe is converted into a vapour state, a gaseous component with an increased pressure (compared to the vacuum in the vacuum chamber) flowing through at least one inlet, against the substrate surface to be coated, such that the gaseous component is adsorbed on the substrate surface to be coated before the substrate is guided past the at least one vessel.

Method for depositing a CdTe layer on a substrate

A method for producing a CdTe solar cell is provided, wherein at least the following layers are deposited on a glass substrate within a vacuum chamber: a TCO layer acting as a frontal contact; at least one CdTe layer; a thin layer of a chlorine-containing compound, and an electrically conductive layer acting as a return contact. Here, a maximally 20 nm thick passivation layer made from CdS, in which chemically non-bound oxygen is embedded, is deposited on the TCO layer prior to deposition of at least one CdTe-layer.

Method for producing a CdTe solar cell

A method for producing a component is provided, where the component comprises a substrate, which emits at least one electromagnetic radiation in a first wavelength range and an electromagnetic radiation in a second wavelength range within one surface area. Electrodes can be formed within the surface area of the substrate; a first layer stack can be deposited, comprising at least one layer, which causes the emission of the electromagnetic radiation in the first wavelength range, and a cover layer, acting as the first counterelectrode, on the entire surface area; the first layer stack can be removed from a first partial surface area, which comprises at least one electrode; a second layer stack can be deposited, comprising at least one layer, which causes the emission of the electromagnetic radiation in the second wavelength range, and a second cover layer, acting as the counterelectrode, on the entire surface area.

Method for producing a multi-colored light emitting component

An apparatus for generating a hollow cathode arc discharge plasma, including two plasma sources, each including a hollow cathode and an electrode which is associated with the hollow cathode and which has an opening that extends through the electrode, wherein the hollow cathodes of the two plasma sources are connected to a pulse generator which generates a bipolar, medium-frequency pulsed voltage between the two hollow cathodes. Here, in each of the two plasma sources, the hollow cathode is connected in an electrically conducting manner, directly or with interconnection of at least one current direction limiting component, to the associated electrode.

Apparatus for generating a hollow cathode arc discharge plasma

Existing devices for vacuum coating substrates having different shapes, either in continuous or hatch facilities, are equipped in such a way that several coatings are applied after a coating process. The slide bearings are to be coated with several coats and the coating materials used and the conditions related thereto require the use of several coating techniques. This relates inter alia to conveyance parameters. Existing facilities fail to meet these requirements. According to the invention, such a device comprises several aligned processing chambers. Slide bearings which are held together by positive and non-positive fit in tempered carrier bodies are displaced through said chambers comprising pretreatment, atomization and evaporation chambers using a conveyance system adapted to this process. A tempering device for the carrier bodies is connected upstream from the coating track. Corresponding inlet and outlet channels enable air-to-air conveyance.

Device for vacuum coating slide bearings

A half bearing has a backing member and at least one metallic overlay, which is applied by electron beam vapour deposition and which comprises at least one finely dispersed component in a matrix material, the atomic weight of which component is greater than that of the matrix material, wherein the concentration of the finely dispersed component (,) decreases continuously from the apex area (,) of the half bearing (,) towards the area (,) of the partial surfaces. The method is characterised in that, during the coating process, an inert gas pressure of 0.1 to 5 Pa is set in the apex area of the bearing shell.

Half bearing and method for the production thereof

A plain bearing overlay (,) of which exhibits properties which are markedly improved with regard to wear resistance in comparison with overlays applied by electroplating and conventional electron beam vapor deposition methods. The surface of the overlay (,) comprises round raised portions (,) and depressed portions (,), wherein, in relation to the horizontal section plane (,), the raised portions (,) cover a proportion of the surface area amounting to 30% to 50%, based on the entire surface area of the plain bearing, the section plane (,) being at a height at which the total proportion of the surface area consisting of the raised portions (,), and obtained in vertical section, is equal to the total corresponding proportion consisting of the depressed portions (,). The round raised portions exhibit a diameter D of 3 to 8 &mgr;m, in plan view, wherein, in the case of raised portions (,) and depressed portions (,) which in plan view are not circular, this value relates to the maximum diameter. The surface exhibits a roughness of R,&equals;3 to 7 &mgr;m. The method of producing such plain bearings is based on electron beam vapor deposition, wherein a backing member with a roughness of R,23 2 &mgr;m is used and vapor deposition of the overlay is effected at a pressure <0.1 Pa.

Plain bearing and method for the production thereof

A plain bearing is described, the overlay (3) of which exhibits properties which are markedly improved with regard to wear resistance in comparison with overlays applied by electroplating and conventional electron beam vapor deposition methods. The surface of the overlay (3) comprises round raised portions (4) and depressed portions (6), wherein, in relation to the horizontal section plane (7), the raised portions (4) cover a proportion of the surface area amounting to 30% to 50%, based on the entire surface area of the plain bearing, the section plane (7) being at a height at which the total proportion of the surface area consisting of the raised portions (4), and obtained in vertical section, is equal to the total corresponding proportion consisting of the depressed portions (6). The round raised portions exhibit a diameter D of 3 to 8 .mu.m, in plan view, wherein, in the case of raised portions (4) and depressed portions (6) which in plan view are not circular, this value relates to the maximum diameter. The surface exhibits a roughness of R.sub.z =3 to 7 .mu.m. The method of producing such plain bearings is based on electron beam vapour deposition, wherein a backing member with a roughness of R.sub.z .ltoreq.2 .mu.m is used and vapor deposition of the overlay is effected at a pressure &lt;0.1 Pa.

Plain bearing

A half bearing has a backing member and at least one metallic overlay, which is applied by electron beam vapor deposition and which comprises at least one finely dispersed component in a matrix material, the atomic weight of which component is greater than that of the matrix material, wherein the concentration of the finely dispersed component (7) decreases continuously from the apex area (8) of the half bearing (1) towards the area (9) of the partial surfaces. The method is characterized in that, during the coating process, an inert gas pressure of 0.1 to 5 Pa is set in the apex area of the bearing shell.

Half bearing

Method and device for control of a vacuum vaporization process

Method and device for pre-treatment of substrates

Concave sliding element and production process therefor

The invention relates to a process for stabilizing plasma generation in the coating of large substrate surfaces by means of an electron beam vaporizer. To obtain a stable operation of the apparatus at a high vaporization rate and stable plasma excitation of the vapour cloud without using additional electrodes, according to the invention the vaporization rate of the electron beam vaporizer is initially set so high that at least 10% of the electron beam power is absorbed in the vaporization chamber by the vapour and the optical emission of the resulting plasma is measured. The operating parameters of the electron gun or a process parameter are then controlled in such a way that the optical emission, and therefore the energy absorption, remains constant.

Process for the stabilization of plasma generation by means of electron

A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.

Method for electron beam deposition of multicomponent evaporants

Device for the vacuum coating of mass produced products

Growing community of inventors

Dresden, Germany

Christoph Metzner