Nanda Technologies Gmbh

Instrument Systems Optische Messtechnik Gmbh

Christoph Kappel

Lars Markwort

Markus Estermann

Reza Kharrazian

Reto Haring

Pierre-Yves Guittet

Florian Schewe

Felix Frank

Amy M Winkler

Corin Michael Ricardo Greaves

The invention relates to an apparatus for generating light, comprising a plurality of light sources (), &#x2014;a control device (), which drives the light sources (), and a superimposition optical unit, which superimposes the light emitted by the light sources () in an exit opening (). It is an object of the invention to provide an apparatus which is improved compared with the prior art. For this purpose, the invention proposes that the superimposition optical unit comprises a first concave mirror (), in the focal plane of which the light sources () are situated, an optical grating (), onto which the first concave mirror () reflects the light () emitted by the light sources (), and &#x2014;a second concave mirror (), which reflects the light () diffracted at the optical grating () onto the exit opening () situated at the focus of the second concave mirror ().

Light source having a controllable spectrum

A method of inspecting a bonded waferarrangement comprises:

Methods and systems for inspecting bonded wafers

A wafer inspection method comprises imaging a full surface of the wafer at an imaging resolution insufficient to resolve individual microstructures which are repetitively arranged on the wafer. A maskis applied to the recorded image and unmasked portionsof the image are further processed by averaging. The unmasked portionsare selected such that they include memory portions of the wafer.

Method of inspecting and processing semiconductor wafers

Growing community of inventors

Aschheim, Germany

Christoph Kappel