Balzers Hochvakuum Ag

Applied Materials, Inc.

Unaxis Trading Ag

Unaxis Deutschland Gmbh

Christoph Daube

Johannes Stollenwerk

Achim G&uuml;rke

Subramanya P Herle

Connie P Wang

Jian Zhu

Roland Trassl

Andreas Kloeppel

Yin Let Sim

Torsten Dieter

James Cushing

Thomas Linz

Achim Gurke

Wen Si

Separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate (), capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer (), capable of conducting ions, formed on the first surface. The first ceramic-containing layer () has a thickness in arrange from about 1,000 nanometers to about 5000 nanometers. The separator further comprises a second ceramic-containing layer (), capable of conducting ions, formed on the second surface. The second ceramic-containing layer () is a binder-free ceramic-containing layer and has a thickness in arrange from about 1 nanometer to about 1,000 nanometers.

Ultra-thin ceramic coating on separator for batteries

Sparking is suppressed during high-frequency sputtering by a high-frequency generator ( ) which has a controlled switching unit ( ) that is connected upstream in relation to the output of the generator. A high-frequency supply signal that is generated at the output of the high-frequency generator is stopped for plasma discharge (PL) for a short time, by the switching unit.

Electric supply unit and method for reducing arcing during sputtering

A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby selecting the purity of the Mg material of the targets to be at least 99% and thereby blowing sputtered-off material out of the slit and toward the substrate. Introduction, in an area between the slit and the substrate, of a reactive gas containing oxygen, follows, and reacting the sputtered-off material with the reactive gas results in depositing on the substrate, an MgO layer. The method also includes setting the temperature of the substrate during the coating process.

Substrate coated with an MgO layer

A method and apparatus for producing a substrate which is coated with a Mgo-layer, includes a pair of Mg targets which define a slit and which have a target purity of at least 99 percent. A working gas flows along the slit. Oxygen is provided in an area between the slit and the substrate to be coated. The temperature of the substrate is set by heating or cooling the substrate during the coating process.

Substrate coated with an MGO-layer

A substrate coated has at least one MgO-layer and an extent of at least 100 mm.times.100 mm. The layer has a predominant peak in the measuring diagram of the .THETA.-2.THETA.-method and the density of the material of the layer is at least 80% of the density of stoichiometric MgO-bulk material, which is .rho.=3.58 g/cm.sup.3.

Substrate coated with an MgO-layer

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Alzenau, Germany

Christoph Daube