Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Christoph Charton

Matthias Fahland

Nicolas Schiller

Steffen Straach

Mario Krug

Mathias Räbisch

Mathias Raebisch

The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.

Method for the production of an ultra barrier layer system

The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.

Method of vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide

Growing community of inventors

Furth im Wald, Germany

Christoph Charton