Asml Netherlands B.v.

Christo Liebenberg

Alexander Anthony Schafgans

Kevin Weimin Zhang

A system includes a plurality of sensors at distinct and separate locations, each of the distinct and separate locations being equidistant from a region that is configured to pass light that propagates along a beam path, the sensors being configured to sense radiation from an optical element positioned to interact with light that propagates on the beam path; and a controller including one or more electronic processors and a computer-readable medium, the computer-readable medium including instructions that, when executed, cause the one or more electronic processors to receive an output from each of the sensors, the output of each sensor including an indication of an intensity of the radiation detected by the sensor, and analyze the received output to determine a position of the light that propagates along the beam path.

Beam position sensor

An extreme ultraviolet light system includes an optical amplifier system and a catalytic conversion system. Each optical amplifier of the optical amplifier system includes a gain medium in the form of a gas mixture that produces an amplified light beam. The optical amplifier system includes a fluid input and a fluid output through which the gas mixture flows. The catalytic conversion system is fluidly connected to the fluid output of the optical amplifier system and to the fluid input of the optical amplifier system. The catalytic conversion system includes a catalytic converter that includes a housing; a substrate within the housing including openings through which the gas mixture can flow; and a catalyst applied as a coating to the interior surfaces of the openings of the substrate, the catalyst including particles of metal. The particles of metal can be nanoparticles of precious metal.

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San Marcos, CA, United States of America

Christo Liebenberg