Atotech Deutschland Gmbh

Atotech Deutschland Gmbh & Co. Kg

Christian Wendeln

Lutz Stamp

Andreas Kirbs

Kay Wurdinger

Sebastian Zarwell

Bexy Dosse

Mayumi Nishikido

Kevin-Sigurt Gottschalk

Gerson Krilles

Edith Steinhäuser

Tang Cam Lai Nguyen

The present invention relates to a method for monitoring the total amount of sulphur containing compounds in a metal or metal alloy plating bath, wherein the sulphur containing compounds contain at least one sulphur atom having an oxidation state below +6, the method comprising the steps (a), (b), optionally (c), and (d). Said method is a means of providing control over a metal plating process. Thus, the present invention relates furthermore to a controlled process for plating a metal on a substrate utilizing the method of the present invention for monitoring the total amount of said sulphur containing compounds.

Method for monitoring the total amount of sulphur containing compounds in a metal plating bath

A process for depositing metal or metal alloy on a substrate including treating the substrate surface with an activation solution comprising a source of metal ions so the metal ions are adsorbed on the substrate surface, treating the obtained substrate surface with a treatment solution containing an additive selected from thiols, thioethers, disulphides and sulphur containing heterocycles, and a reducing agent suitable to reduce the metal ions adsorbed on the substrate surface selected from boron based reducing agents, hypophosphite ions, hydrazine and hydrazine derivatives, ascorbic acid, iso-ascorbic acid, sources of formaldehyde, glyoxylic acid, sources of glyoxylic acid, glycolic acid, formic acid, sugars, and salts of aforementioned acids; and subsequently treating the substrate surface with a metallizing solution comprising a source of metal ions to be deposited such that a metal or metal alloy is deposited thereon.

Process for depositing a metal or metal alloy on a surface of a substrate including its activation

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Berlin, Germany

Christian Wendeln