Carl Zeiss Smt Gmbh

Christian Rensing

Michael Budach

Christian Wojek

Alexander Freytag

Nicole Auth

A device for examining and/or processing an element for photolithography with a beam of charged particles, the device including (a) means for acquiring measurement data while the element for photolithography is exposed to the beam of charged particles; and (b) means for predetermining a drift of the beam of charged particles relative to the element for photolithography with a trained machine learning model and/or a predictive filter. The trained machine learning model and/or the predictive filter use(s) at least the measurement data as input data.

Growing community of inventors

Bensheim, Germany

Christian Rensing